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  2. Piranha solution - Wikipedia

    en.wikipedia.org/wiki/Piranha_solution

    Piranha solution, also known as piranha etch, is a mixture of sulfuric acid (H2SO4) and hydrogen peroxide (H2O2). The resulting mixture is used to clean organic residues off substrates, for example silicon wafers. [1] Because the mixture is a strong oxidizing agent, it will decompose most organic matter, and it will also hydroxylate most ...

  3. RCA clean - Wikipedia

    en.wikipedia.org/wiki/RCA_clean

    The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in semiconductor manufacturing. Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio Corporation of America. [1][2][3] It involves the following ...

  4. Piranha etch - Wikipedia

    en.wikipedia.org/?title=Piranha_etch&redirect=no

    This page was last edited on 6 August 2007, at 19:43 (UTC).; Text is available under the Creative Commons Attribution-ShareAlike License 4.0; additional terms may ...

  5. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer ...

  6. Plasma cleaning - Wikipedia

    en.wikipedia.org/wiki/Plasma_cleaning

    Plasma cleaning is the removal of impurities and contaminants from surfaces through the use of an energetic plasma or dielectric barrier discharge (DBD) plasma created from gaseous species. Gases such as argon and oxygen, as well as mixtures such as air and hydrogen/nitrogen are used. The plasma is created by using high frequency voltages ...

  7. Surface treatment of PTFE - Wikipedia

    en.wikipedia.org/wiki/Surface_treatment_of_PTFE

    Sodium treated PTFE will degrade with exposure to UV radiation. Immediately after sodium treatment, the PTFE surface is dark brown. The weaker the etching solution, the lighter the color change and the weaker the bond will be. [1] When exposed to UV radiation, the treated PTFE will gradually return to its original white color.

  8. Buffered oxide etch - Wikipedia

    en.wikipedia.org/wiki/Buffered_oxide_etch

    Buffered oxide etch (BOE), also known as buffered HF or BHF, is a wet etchant used in microfabrication. It is a mixture of a buffering agent, such as ammonium fluoride NH4F, and hydrofluoric acid (HF). Its primary use is in etching thin films of silicon nitride (Si 3 N 4) or silicon dioxide (SiO 2), by the reaction: SiO2 + 4HF + 2NH4F → (NH4 ...

  9. An ex-Mastercard executive was nearly scammed of $100,000 ...

    www.aol.com/news/ex-mastercard-executive-nearly...

    Peter Dazeley/Getty Images. A former Mastercard executive almost lost $100,000 to an account takeover scam. Scammers accessed her real-estate agent's email and impersonated a title company ...

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