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  2. Atomic layer deposition - Wikipedia

    en.wikipedia.org/wiki/Atomic_layer_deposition

    Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals called precursors (also called "reactants"). These precursors react with the surface of a material one at a time in a ...

  3. Plasma electrolytic oxidation - Wikipedia

    en.wikipedia.org/wiki/Plasma_electrolytic_oxidation

    In conventional anodizing, this layer of oxide is grown on the surface of the metal by the application of electrical potential, while the part is immersed in an acidic electrolyte. In plasma electrolytic oxidation, higher potentials are applied. For example, in the plasma electrolytic oxidation of aluminum, at least 200 V must be applied.

  4. Anodic aluminium oxide - Wikipedia

    en.wikipedia.org/wiki/Anodic_aluminium_oxide

    Anodic aluminum oxide, anodic aluminum oxide (AAO), or anodic alumina is a self-organized form of aluminum oxide that has a honeycomb-like structure formed by high density arrays of uniform and parallel pores. The diameter of the pores can be as low as 5 nanometers and as high as several hundred nanometers, and length can be controlled from few ...

  5. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

  6. Chemical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Chemical_vapor_deposition

    The choice of source gas depends on the thermal stability of the substrate; for instance, aluminium is sensitive to high temperature. Silane deposits between 300 and 500 °C, dichlorosilane at around 900 °C, and TEOS between 650 and 750 °C, resulting in a layer of low- temperature oxide (LTO).

  7. Aluminium oxide - Wikipedia

    en.wikipedia.org/wiki/Aluminium_oxide

    Aluminium oxide (or aluminium(III) oxide) is a chemical compound of aluminium and oxygen with the chemical formula Al 2 O 3. It is the most commonly occurring of several aluminium oxides, and specifically identified as aluminium oxide. It is commonly called alumina and may also be called aloxide, aloxite, or alundum in various forms and ...

  8. Bayer process - Wikipedia

    en.wikipedia.org/wiki/Bayer_process

    The Bayer process is the principal industrial means of refining bauxite to produce alumina (aluminium oxide) and was developed by Carl Josef Bayer.Bauxite, the most important ore of aluminium, contains only 30–60% aluminium oxide (Al 2 O 3), the rest being a mixture of silica, various iron oxides, and titanium dioxide. [1]

  9. Electroplating - Wikipedia

    en.wikipedia.org/wiki/Electroplating

    Electroplating, also known as electrochemical deposition or electrodeposition, is a process for producing a metal coating on a solid substrate through the reduction of cations of that metal by means of a direct electric current.