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  2. Focused ion beam - Wikipedia

    en.wikipedia.org/wiki/Focused_ion_beam

    Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM).

  3. Ion-beam sculpting - Wikipedia

    en.wikipedia.org/wiki/Ion-beam_sculpting

    The first step in ion sculpting is to make either a through hole or a blind hole (not penetrating completely), most commonly using a focused ion beam (FIB). The holes are commonly about 100 nm in diameter, but can be made much smaller. This step may or may not be done at room temperature, with a low temperature of -120 C. Next, three common ...

  4. Ion beam - Wikipedia

    en.wikipedia.org/wiki/Ion_beam

    A small ion beam rocket being tested by NASA. An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely ...

  5. Ion beam analysis - Wikipedia

    en.wikipedia.org/wiki/Ion_beam_analysis

    Ion beam analysis (IBA) is an important family of modern analytical techniques involving the use of MeV ion beams to probe the composition and obtain elemental depth profiles in the near-surface layer of solids. IBA is not restricted to MeV energy ranges.

  6. Category:Semiconductor device fabrication - Wikipedia

    en.wikipedia.org/wiki/Category:Semiconductor...

    Ion beam lithography; Ion beam mixing; Ion implantation; Ion layer gas reaction; L. Laser chemical vapor deposition; Laser trimming; Layer (electronics) Lift-off ...

  7. Stopping and Range of Ions in Matter - Wikipedia

    en.wikipedia.org/wiki/Stopping_and_Range_of_Ions...

    As the input parameters, it needs the ion type and energy (in the range 10 eV – 2 GeV) and the material of one or several target layers. As the output, it lists or plots the three-dimensional distribution of the ions in the solid and its parameters, such as penetration depth, its spread along the ion beam (called straggle) and perpendicular to it, all target atom cascades in the target are ...

  8. Ion beam lithography - Wikipedia

    en.wikipedia.org/wiki/Ion_beam_lithography

    Ion-beam lithography, or ion-projection lithography, is similar to Electron beam lithography, but uses much heavier charged particles, ions. In addition to diffraction being negligible, ions move in straighter paths than electrons do both through vacuum and through matter, so there seems be a potential for very high resolution.

  9. Ion beam deposition - Wikipedia

    en.wikipedia.org/wiki/Ion_beam_deposition

    Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2] In the ion source ...

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