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Physical Vapor Deposition Technique
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Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM).
Ion milling is a specialized physical etching technique that is a crucial step in the preparation of material analysis techniques. After a specimen goes through ion milling, the surface becomes much smoother and more defined, which allows scientists to study the material much easier.
The first major use of ion figuring was in making the mirror segments for the Keck telescope. The ultra-high precision requirements for optical surfaces for X-ray astronomy and deep-ultraviolet lithography often require ion figuring. Issues for ion beam figuring included re-sputtering and contamination. [3]
The GCIB beam is then used to treat a surface — typically the treated substrate is mechanically scanned in the beam to allow uniform irradiation of the surface. Argon is a commonly used gas in GCIB treatments because it is chemically inert and inexpensive.
The first step in ion sculpting is to make either a through hole or a blind hole (not penetrating completely), most commonly using a focused ion beam (FIB). The holes are commonly about 100 nm in diameter, but can be made much smaller. This step may or may not be done at room temperature, with a low temperature of -120 C. Next, three common ...
Ion beam treatments with pure argon or pure oxygen result in minimal defluorination as determined by F/C ratio. Contact angle actually increased with ion beam treatment. [6] Peel strength with ion beam treatment increased as a function of the ion beam dose, achieving higher peel strengths than plasma-treated samples at doses above 5E15 ions/cm ...
In electronics, a cross section, cross-section, or microsection, is a prepared electronics sample that allows analysis at a plane that cuts through the sample.It is a destructive technique requiring that a portion of the sample be cut or ground away to expose the internal plane for analysis.
Ion beam analysis (IBA) is an important family of modern analytical techniques involving the use of MeV ion beams to probe the composition and obtain elemental depth profiles in the near-surface layer of solids. IBA is not restricted to MeV energy ranges.
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