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An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely used ion beams are of singly-charged ions.
Recently however, there have been competing sources for archaeometry purposes using X-ray based methods such as XRF. Nonetheless, the most preferred and accurate source is ion beam analysis, which is still unmatched in its analysis of light elements and chemical 3D imaging applications (i.e. artwork and archaeological artifacts). [6] [7]
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]
Electron capture ionization (ECI) is the ionization of a gas phase atom or molecule by attachment of an electron to create an ion of the form A −•.The reaction is + where the M over the arrow denotes that to conserve energy and momentum a third body is required (the molecularity of the reaction is three).
Ion implantation setup with mass separator. Ion implantation equipment typically consists of an ion source, where ions of the desired element are produced, an accelerator, where the ions are electrostatically accelerated to a high energy or using radiofrequency, and a target chamber, where the ions impinge on a target, which is the material to be implanted.
Most widespread instruments are using liquid metal ion sources (LMIS), especially gallium ion sources. Ion sources based on elemental gold and iridium are also available. In a gallium LMIS, gallium metal is placed in contact with a tungsten needle, and heated gallium wets the tungsten and flows to the tip of the needle, where the opposing forces of surface tension and electric field form the ...
A particle beam is a stream of charged or neutral particles.In particle accelerators, these particles can move with a velocity close to the speed of light.There is a difference between the creation and control of charged particle beams and neutral particle beams, as only the first type can be manipulated to a sufficient extent by devices based on electromagnetism.
This type of ion gun is easy to operate and generates roughly focused but high current ion beams. A second source type, the surface ionization source, generates 133 Cs + primary ions. [11] Cesium atoms vaporize through a porous tungsten plug and are ionized during evaporation. Depending on the gun design, fine focus or high current can be obtained.
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