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Thin-film thickness monitors, deposition rate controllers, and so on, are a family of instruments used in high and ultra-high vacuum systems. They can measure the thickness of a thin film , not only after it has been made, but while it is still being deposited , and some can control either the final thickness of the film, the rate at which it ...
The act of applying a thin film to a surface is thin-film deposition – any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. "Thin" is a relative term, but most deposition techniques control layer thickness within a few tens of nanometres.
Ellipsometry is a very sensitive measurement technique and provides unequaled capabilities for thin film metrology. As an optical technique, spectroscopic ellipsometry is non-destructive and contactless.
Resistor based on the sheet resistance of carbon film. Sheet resistance is the resistance of a square piece of a thin material with contacts made to two opposite sides of the square. [1] It is usually a measurement of electrical resistance of thin films that are uniform in thickness.
Below are schematics depicting the thin film measurement process: Thin film characterization involves determining the film's thickness ( t ) plus its refractive index ( n ) and extinction coefficient ( k ) over as wide a wavelength range as possible, preferably covering ultra-violet through near infra-red wavelengths (190–1000 nm).
For thin films in liquids, there is an approximate analytical result, relating the elastic compliance of the film, J F ’ to the ratio of Δ(w/2); and Δf. The shear compliance is the inverse of the shear modulus, G. In the thin-film limit, the ratio of Δ(w/2) and –Δf is independent of film thickness. It is an intrinsic property of the film.
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