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Beyond the models used for RET and OPC, computational lithography attempts to improve chip manufacturability and yields such as by using the signature of the scanner to help improve accuracy of the OPC model: [8] polarization characteristics of the lens pupil, Jones matrix of the stepper lens, optical parameters of the photoresist stack ...
An illustration of OPC (Optical Proximity Correction). The blue Γ-like shape is what chip designers would like printed on a wafer, in green is the pattern on a mask after applying optical proximity correction, and the red contour is how the shape actually prints on the wafer (quite close to the desired blue target).
The first commercial version of the software, named PROLITH/2, was released in June of that year. PROLITH was made easier to use and it grew to include many more aspects of lithography simulation. FINLE Technologies was purchased in February 2000 by KLA-Tencor , which now markets PROLITH.
Photolithography (also known as optical lithography) is a process used in the manufacturing of integrated circuits. It involves using light to transfer a pattern onto a substrate, typically a silicon wafer. The process begins with a photosensitive material, called a photoresist, being applied to the substrate.
Although EUV has been projected to be the next-generation lithography of choice, it could still require more than one lithographic exposure, due to the foreseen need to first print a series of lines and then cut them; a single EUV exposure pattern has difficulty with line end-to-end spacing control. [12]
With a proper optical imaging system between the mask and the wafer (or no imaging system if the mask is sufficiently closely positioned to the wafer such as in early lithography machines), the mask pattern is imaged on a thin layer of photoresist on the surface of the wafer and a light (UV or EUV)-exposed part of the photoresist experiences ...
By virtue of the linearity property of optical non-coherent imaging systems, i.e., . Image(Object 1 + Object 2) = Image(Object 1) + Image(Object 2). the image of an object in a microscope or telescope as a non-coherent imaging system can be computed by expressing the object-plane field as a weighted sum of 2D impulse functions, and then expressing the image plane field as a weighted sum of the ...
Immersion lithography is a technique used in semiconductor manufacturing to enhance the resolution and accuracy of the lithographic process. It involves using a liquid medium, typically water, between the lens and the wafer during exposure.