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  2. Photopolymer - Wikipedia

    en.wikipedia.org/wiki/Photopolymer

    A photopolymer or light-activated resin is a polymer that changes its properties when exposed to light, often in the ultraviolet or visible region of the electromagnetic spectrum. [1] These changes are often manifested structurally, for example hardening of the material occurs as a result of cross-linking when exposed to light.

  3. SU-8 photoresist - Wikipedia

    en.wikipedia.org/wiki/SU-8_photoresist

    SU-8 molecule. SU-8 is a commonly used epoxy-based negative photoresist.Negative refers to a photoresist whereby the parts exposed to UV become cross-linked, while the remainder of the film remains soluble and can be washed away during development.

  4. Resin casting - Wikipedia

    en.wikipedia.org/wiki/Resin_casting

    Resin casting is more labor intensive than injection molding, and the soft molds used are worn down by each cast. The low initial investment cost of resin casting means that individual hobbyists can produce small runs for their own use, such as customization, while companies can use it to produce small runs for public sale.

  5. Photoresist - Wikipedia

    en.wikipedia.org/wiki/Photoresist

    One very common positive photoresist used with the I, G and H-lines from a mercury-vapor lamp is based on a mixture of diazonaphthoquinone (DNQ) and novolac resin (a phenol formaldehyde resin). DNQ inhibits the dissolution of the novolac resin, but upon exposure to light, the dissolution rate increases even beyond that of pure novolac.

  6. Ultraviolet - Wikipedia

    en.wikipedia.org/wiki/Ultraviolet

    Some sources use the distinction of "hard UV" and "soft UV". For instance, in the case of astrophysics , the boundary may be at the Lyman limit (wavelength 91.2 nm, the energy needed to ionise a hydrogen atom from its ground state), with "hard UV" being more energetic; [ 21 ] the same terms may also be used in other fields, such as cosmetology ...

  7. Nanoimprint lithography - Wikipedia

    en.wikipedia.org/wiki/Nanoimprint_lithography

    In photo nanoimprint lithography (P-NIL), a UV-curable liquid resist is applied to the sample substrate, and the mold is normally made of transparent material like fused silica or PDMS. After the mold and the substrate are pressed together, the resist is cured in UV light and becomes solid.

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