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The dimeric silicon dioxide, (SiO 2) 2 has been obtained by reacting O 2 with matrix isolated dimeric silicon monoxide, (Si 2 O 2). In dimeric silicon dioxide there are two oxygen atoms bridging between the silicon atoms with an Si–O–Si angle of 94° and bond length of 164.6 pm and the terminal Si–O bond length is 150.2 pm.
The number of possible isomers increases rapidly with the number of silicon atoms. The members of the series (in terms of number of silicon atoms) follow: silane, SiH 4, 1 silicon atom and 4 hydrogen atoms, analogous to methane; disilane, Si 2 H 6 or H 3 Si−SiH 3, 2 silicon atoms and 6 hydrogen atoms, analogous to ethane
Silicon compounds are compounds containing the element silicon (Si). As a carbon group element, silicon often forms compounds in the +4 oxidation state, though many unusual compounds have been discovered that differ from expectations based on its valence electrons, including the silicides and some silanes.
Covalent silicides and silicon compounds occur with hydrogen and the elements in groups 10 to 17. Transition metals form metallic silicides, with the exceptions of silver, gold and the group 12 elements. The general composition is M n Si or MSi n with n ranging from 1 to 6 and M standing for metal.
A compound semiconductor is a semiconductor compound composed of chemical elements of at least two different species. These semiconductors form for example in periodic table groups 13–15 (old groups III–V), for example of elements from the Boron group (old group III, boron, aluminium, gallium, indium) and from group 15 (old group V, nitrogen, phosphorus, arsenic, antimony, bismuth).
A silicon–oxygen bond (Si−O bond) is a chemical bond between silicon and oxygen atoms that can be found in many inorganic and organic compounds. [1] In a silicon–oxygen bond, electrons are shared unequally between the two atoms, with oxygen taking the larger share due to its greater electronegativity.
Leaching powdered 96–97% pure silicon with water results in ~98.5% pure silicon, which is used in the chemical industry. However, even greater purity is needed for semiconductor applications, and this is produced from the reduction of tetrachlorosilane (silicon tetrachloride) or trichlorosilane.
Oxidation of organosilicon compounds, including siloxanes, gives silicon dioxide. This conversion is illustrated by the combustion of hexamethylcyclotrisiloxane: ((CH 3) 2 SiO) 3 + 12 O 2 → 3 SiO 2 + 6 CO 2 + 9 H 2 O. Strong base degrades siloxane group, often affording siloxide salts: ((CH 3) 3 Si) 2 O + 2 NaOH → 2 (CH 3) 3 SiONa + H 2 O