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High Frequency Data Link (HFDL) is an ACARS communications medium used to exchange data such as Aeronautical Operational Control (AOC) messages, Controller Pilot Data Link Communications (CPDLC) messages and Automatic Dependent Surveillance (ADS) messages between aircraft end-systems and corresponding ground-based HFDL ground stations.
STANAG 5066 (Profile for High Frequency (HF) Radio Data Communication) is a NATO Standardization Agreement specification to enable applications to communicate efficiently over HF radio. STANAG 5066 provides peer protocols that operate above an HF modem and below the application level.
Prior to the creation of the DHFCS, the Royal Air Force (RAF) and Royal Navy (RN) operated their own independent high frequency (HF) communications systems. The RAF's Strike Command Integrated Communications System (STCICS), later known as Terrestrial Air Sea Communications (TASCOMM), operated from six sites within the UK whilst the RN system had twelve sites. [2]
High frequency (HF) is the ITU designation [1] [2] for the band of radio waves with frequency between 3 and 30 megahertz (MHz). It is also known as the decameter band or decameter wave as its wavelengths range from one to ten decameters (ten to one hundred meters).
Solid HF consists of zig-zag chains of HF molecules. The HF molecules, with a short covalent H–F bond of 95 pm length, are linked to neighboring molecules by intermolecular H–F distances of 155 pm. [4] Liquid HF also consists of chains of HF molecules, but the chains are shorter, consisting on average of only five or six molecules. [5]
Housing Finance Company Limited is a large mortgage finance company, serving the mortgage needs of the Kenyan population. As of December 2020, the company's total assets were valued at KSh55,445,249,000 (approximately US$497 million), with shareholders' equity of KSh8.562 billion (approx. US$76.8 million).
Formation of HF is a drawback, as the HF vapor is very aggressive and etches away most materials. Also, the deposited tungsten shows poor adhesion to the silicon dioxide which is the main passivation material in semiconductor electronics. Therefore, SiO 2 has to be covered with an extra buffer layer prior to the tungsten deposition. On the ...
The separation of HfCl 4 and ZrCl 4 is difficult because the compounds of Hf and Zr have very similar chemical and physical properties. Their atomic radii are similar: the atomic radius is 156.4 pm for hafnium, whereas that of Zr is 160 pm. [ 10 ] These two metals undergo similar reactions and form similar coordination complexes.