Ads
related to: laboratory spin coaterebay.com has been visited by 1M+ users in the past month
Search results
Results from the WOW.Com Content Network
Laurell Technologies WS-400 spin coater used to apply photoresist to the surface of a silicon wafer. Spin coating is a procedure used to deposit uniform thin films onto flat substrates. Usually a small amount of coating material in liquid form is applied on the center of the substrate, which is either spinning at low speed or not spinning at all.
There are four basic parameters that are involved in spin coating: solution viscosity, solid content (density), angular speed, and spin time. [13] A range of thicknesses can be achieved by spin coating. Most commonly the thicknesses range from 1-200 μm. The main properties that affect the thickness of the film are viscosity and spin speed.
Slot-die coating is a non-contact coating method, in which the slot-die is typically held over the substrate at a height several times higher than the target wet film thickness. [23] The coating fluid transfers from the slot-die to the substrate via a fluid bridge that spans the air gap between the slot-die lips and substrate surface.
Since the foundation of the company GMA in 1989, which emerged from the former Elektromat, in Sacka near Dresden, Suss Microtec has been producing its own systems for testing micro components. In 1993, Suss Microtec expanded its product range with the acquisition of the French S.E.T. to include spin coaters and device bonders.
The wafer is covered with photoresist liquid by spin coating. Thus, the top layer of resist is quickly ejected from the wafer's edge while the bottom layer still creeps slowly radially along the wafer. In this way, any 'bump' or 'ridge' of resist is removed, leaving a very flat layer.
The precursor sol can be either deposited on a substrate to form a film (e.g., by dip-coating or spin coating), cast into a suitable container with the desired shape (e.g., to obtain monolithic ceramics, glasses, fibers, membranes, aerogels), or used to synthesize powders (e.g., microspheres, nanospheres). [1]
Sputter coating in scanning electron microscopy is a sputter deposition process [clarification needed] to cover a specimen with a thin layer of conducting material, typically a metal, such as a gold/palladium (Au/Pd) alloy. A conductive coating is needed to prevent charging of a specimen with an electron beam in conventional SEM mode (high ...
Once the glass substrate is cleaned using detergents and ultrasonic baths, the glass is placed in a spin coater. The spin coater rinses the glass blank with a solvent and then applies either photoresist or dye-polymer depending on the mastering process. Rotation spreads photoresist or dye-polymer coating evenly across the surface of the glass.
Ads
related to: laboratory spin coaterebay.com has been visited by 1M+ users in the past month