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TGA – Thermogravimetric analysis; TIKA – Transmitting ion kinetic analysis; TIMS – Thermal ionization mass spectrometry; TIRFM – Total internal reflection fluorescence microscopy; TLS – Photothermal lens spectroscopy, a type of photothermal spectroscopy; TMA – Thermomechanical analysis; TOF-MS – Time-of-flight mass spectrometry
An LSAT single-crystal substrate (5x5x0.5 mm) LSAT is primarily used in its single crystal form, typically as thin (≤1 mm) wafers. These wafers are used as a common substrate for epitaxial growth of thin films. LSAT substrates are popular for epitaxial oxides and their heterostructures, often in the study of electron correlation phenomena.
A typical substrate might be rigid such as metal, concrete, or glass, onto which a coating might be deposited. Flexible substrates are also used. [1] Some substrates are anisotropic with surface properties being different depending on the direction: examples include wood and paper products.
Rogers offers liquid cooling materials designed to dissipate large amounts of heat, and provide thermal management of high-power laser diodes and other heat-generating optical devices. The cooling structures are copper foil channels bonded into a tight block, with aluminum-nitride (AlN) isolation layers added for extra performance.
[1] [2] The scope of the term often differs; some definitions limit the term's use to techniques which study the microscopic structure and properties of materials, [2] while others use the term to refer to any materials analysis process including macroscopic techniques such as mechanical testing, thermal analysis and density calculation. [3]
Small-angle X-ray scattering (SAXS) is a small-angle scattering technique by which nanoscale density differences in a sample can be quantified. This means that it can determine nanoparticle size distributions, resolve the size and shape of (monodisperse) macromolecules, determine pore sizes and characteristic distances of partially ordered materials. [1]
Redeposition of sputtered material on the substrate can also give problems, especially at high sputtering pressures. Sputtering of the surface of a compound or alloy material can result in the surface composition being changed. Often the species with the least mass or the highest vapor pressure is the one preferentially sputtered from the surface.
Molecular-beam epitaxy takes place in high vacuum or ultra-high vacuum (10 −8 –10 −12 Torr).The most important aspect of an MBE process is the deposition rate (typically less than 3,000 nm per hour) that allows the films to grow epitaxially (in layers on top of the existing crystal).