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Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM).
Ion-beam lithography, or ion-projection lithography, is similar to Electron beam lithography, but uses much heavier charged particles, ions. In addition to diffraction being negligible, ions move in straighter paths than electrons do both through vacuum and through matter, so there seems be a potential for very high resolution.
Ion beams can be used for material modification (e.g. by sputtering or ion beam etching) and for ion beam analysis. Ion beam application, etching, or sputtering, is a technique conceptually similar to sandblasting, but using individual atoms in an ion beam to ablate a target. Reactive ion etching is an important extension that uses chemical ...
Electron-beam-induced deposition (EBID) is a process of decomposing gaseous molecules by an electron beam leading to deposition of non-volatile fragments onto a nearby substrate. The electron beam is usually provided by a scanning electron microscope , which results in high spatial accuracy (potentially below one nanometer) and the possibility ...
Gallium ion implantation can be used as etch mask in cryo-DRIE. Combined nanofabrication process of focused ion beam and cryo-DRIE was first reported by N Chekurov et al in their article "The fabrication of silicon nanostructures by local gallium implantation and cryogenic deep reactive ion etching".
The first step in ion sculpting is to make either a through hole or a blind hole (not penetrating completely), most commonly using a focused ion beam (FIB). The holes are commonly about 100 nm in diameter, but can be made much smaller. This step may or may not be done at room temperature, with a low temperature of -120 C. Next, three common ...
A diffractive beam splitter with three-dimensional structure created using nanoimprint lithography. Nanoimprint lithography (NIL) is a method of fabricating nanometer-scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution.
Proton beam writing (or p-beam writing) is a direct-write lithography process that uses a focused beam of high energy protons to pattern resist material at nanodimensions. [11] The process, although similar in many ways to direct writing using electrons , nevertheless offers some interesting and unique advantages.
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