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A schematic illustration of a photomask (top) and an IC layer printed using it (bottom) A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a ...
The Bahtinov mask is a device used to focus small astronomical telescopes accurately. Although masks have long been used as focusing aids, the distinctive pattern was invented by Russian amateur astrophotographer Pavel Bahtinov (Russian: Павел Бахтинов) in 2005. [1][2] Precise focusing of telescopes and astrographs is critical to ...
For example, the alternating phase-shift mask technique is being used by Intel to print gates for their 65 nm and subsequent node transistors. [3] [4] While alternating phase-shift masks are a stronger form of resolution enhancement than attenuated phase-shift masks, their use has more complex consequences. For example, a 180 degree phase edge ...
Photolithography. Photolithography (also known as optical lithography) is a process used in the manufacturing of integrated circuits. It involves using light to transfer a pattern onto a substrate, typically a silicon wafer. The process begins with a photosensitive material, called a photoresist, being applied to the substrate.
Multiple patterning. Multiple patterning (or multi-patterning) is a class of technologies for manufacturing integrated circuits (ICs), developed for photolithography to enhance the feature density. It is expected to be necessary for the 10 nm and 7 nm node semiconductor processes and beyond.
Integrated circuit layout. In integrated circuit design, integrated circuit (IC) layout, also known IC mask layout or mask design, is the representation of an integrated circuit in terms of planar geometric shapes which correspond to the patterns of metal, oxide, or semiconductor layers that make up the components of the integrated circuit.
An illustration of OPC (Optical Proximity Correction). The blue Γ-like shape is what chip designers would like printed on a wafer, in green is the pattern on a mask after applying optical proximity correction, and the red contour is how the shape actually prints on the wafer (quite close to the desired blue target).
Maskless lithography has two approaches to project a pattern: rasterized and vectorized. In the first one it utilizes generation of a time-variant intermittent image on an electronically modifiable (virtual) mask that is projected with known means (also known as laser direct imaging and other synonyms). In the vectored approach, direct writing ...
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