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Electrophoretic Deposition Process. Electrophoretic deposition (EPD), is a term for a broad range of industrial processes which includes electrocoating, cathodic electrodeposition, anodic electrodeposition, and electrophoretic coating, or electrophoretic painting.
One such example is the formation of silver chloride on silver wire in chloride solutions to make silver/silver-chloride (AgCl) electrodes. Electropolishing, a process that uses an electric current to selectively remove the outermost layer from the surface of a metal object, is the reverse of the process of electroplating. [1]
Electrostatic spray-assisted vapour deposition (ESAVD) is a technique (developed by a company called IMPT) to deposit both thin and thick layers of a coating onto various substrates. In simple terms chemical precursors are sprayed across an electrostatic field towards a heated substrate, the chemicals undergo a controlled chemical reaction and ...
Electroplating, a process that uses electric current to reduce dissolved metal cations so that they form a coherent metal coating on an electrode Electrophoretic deposition , a term for a broad range of industrial processes which includes electrocoating, e-coating, cathodic electrodeposition, anodic electrodeposition and electrophoretic coating ...
Electrostatic coating is a manufacturing process that employs charged particles to more efficiently paint a workpiece. Paint, in the form of either powdered particles or atomized liquid, is initially projected towards a conductive workpiece using normal spraying methods, and is then accelerated toward the work piece by a powerful electrostatic charge.
Specific technologies can impose constraints; for example, the line-of-sight transfer is typical of most PVD coating techniques, however, some methods allow full coverage of complex geometries. Some PVD technologies operate at high temperatures and vacuums, requiring special attention by operating personnel and sometimes a cooling water system ...
Some examples where CVI process is used in the manufacturing are: Carbon / Carbon Composites (C/C) Based on previous study, a PAN-based carbon felt is chosen as preform, while kerosene is chosen as a precursor. The infiltration of matrix in the preform is performed at 1050 °C for several hours at atmospheric pressure by the FCVI.
Thin-film deposition is a process applied in the semiconductor industry to grow electronic materials, in the aerospace industry to form thermal and chemical barrier coatings to protect surfaces against corrosive environments, in optics to impart the desired reflective and transmissive properties to a substrate and elsewhere in industry to modify surfaces to have a variety of desired properties.
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