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In contrast to Direct-to-garment (DTG) printing, in which designs are printed directly onto the garments, DTF employs a two-step process. [citation needed] The first step in the Direct-to-film (DTF) printing method involves initially printing the design onto a PET (Polyethylene Terephthalate) film and then applying an adhesive powder to the printed film.
UV pinning enhances the management of drop size and image integrity, minimizing the unwanted mixing of drops and providing the highest possible image quality and the sharpest colour rendering. Challenge: Overcome the wetting problems that were causing UV-Curable inks to spread and cause ink droplets to bleed into each other before full curing ...
Usually made of plastic, the first patent for a coffee cup lid design was filed in 1967 and focused on creating a tight seal between the cup and the lid to reduce leaking and a vent hole to allow steam to escape. [14] [15] [16] However, there was no opening for drinking, and the consumer would have to tear into the lid. [17]
UV mapping is the 3D modeling process of projecting a 3D model's surface to a 2D image for texture mapping. The letters "U" and "V" denote the axes of the 2D texture because "X", "Y", and "Z" are already used to denote the axes of the 3D object in model space, while "W" (in addition to XYZ) is used in calculating quaternion rotations, a common ...
Two women were fatally stabbed in their U.K. apartment on Christmas Day and now a 49-year-old man is charged with double murder in connection with their deaths as well as the non-fatal stabbings ...
Gas prices tick lower.From AAA: "At the pump, the national average for a gallon of gas dropped two cents since last week to $3.06 – matching the January 2024 low.There are now 28 states with ...
President-elect Trump’s proposed 25% tariff on Canada and Mexico imports aims to boost U.S. leverage, with one expert expecting targeted, strategic use.
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
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