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  2. Plasma cutting - Wikipedia

    en.wikipedia.org/wiki/Plasma_cutting

    Plasma cutting. Plasma cutting is a process that cuts through electrically conductive materials by means of an accelerated jet of hot plasma. Typical materials cut with a plasma torch include steel, stainless steel, aluminum, brass and copper, although other conductive metals may be cut as well. Plasma cutting is often used in fabrication shops ...

  3. Pinch (plasma physics) - Wikipedia

    en.wikipedia.org/wiki/Pinch_(plasma_physics)

    Basic mechanism. This is a basic explanation of how a pinch works. (1) Pinches apply a high voltage and current across a tube. This tube is filled with a gas, typically a fusion fuel such as deuterium. If the product of the voltage & the charge is higher than the ionization energy of the gas the gas ionizes. (2) Current jumps across this gap.

  4. Plasma torch - Wikipedia

    en.wikipedia.org/wiki/Plasma_torch

    Plasma torch. A plasma torch cutter. A plasma torch (also known as a plasma arc, plasma gun, plasma cutter, or plasmatron) is a device for generating a directed flow of plasma. [1][2][3] The plasma jet can be used for applications including plasma cutting, plasma arc welding, plasma spraying, and plasma gasification for waste disposal. [4]

  5. Inductively coupled plasma - Wikipedia

    en.wikipedia.org/wiki/Inductively_coupled_plasma

    Fig. 2. The construction of Inductively Coupled Plasma torch. [3] A: cooling gas tangential flow to the outer quartz tube B: discharge gas flow (usually Ar) C: flow of carrier gas with sample D: induction coil which forms the strong magnetic field inside the torch E: force vectors of the magnetic field F: the plasma torch (the discharge).

  6. Plasma etching - Wikipedia

    en.wikipedia.org/wiki/Plasma_etching

    A plasma etcher, or etching tool, is a tool used in the production of semiconductor devices. A plasma etcher produces a plasma from a process gas, typically oxygen or a fluorine -bearing gas, using a high frequency electric field, typically 13.56 MHz. A silicon wafer is placed in the plasma etcher, and the air is evacuated from the process ...

  7. Two-stream instability - Wikipedia

    en.wikipedia.org/wiki/Two-stream_instability

    Two-stream instability. The two-stream instability is a very common instability in plasma physics. It can be induced by an energetic particle stream injected in a plasma, or setting a current along the plasma so different species (ions and electrons) can have different drift velocities. The energy from the particles can lead to plasma wave ...

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  9. Plasma parameters - Wikipedia

    en.wikipedia.org/wiki/Plasma_parameters

    The plasma collisionality is defined as [4] [5] =, where denotes the electron-ion collision frequency, is the major radius of the plasma, is the inverse aspect-ratio, and is the safety factor. The plasma parameters m i {\displaystyle m_{\mathrm {i} }} and T i {\displaystyle T_{\mathrm {i} }} denote, respectively, the mass and temperature of the ...

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