Search results
Results from the WOW.Com Content Network
Ion sources are fundamental to ion milling. Their design and operation are crucial to producing accurate results. The most commonly used ion source relies on radiofrequency (RF) ion sources and direct current (DC) electric fields to generate and accelerate ions from a gas, typically a noble gas like argon or xenon.
Most widespread instruments are using liquid metal ion sources (LMIS), especially gallium ion sources. Ion sources based on elemental gold and iridium are also available. In a gallium LMIS, gallium metal is placed in contact with a tungsten needle, and heated gallium wets the tungsten and flows to the tip of the needle, where the opposing forces of surface tension and electric field form the ...
A plasma containing oxygen is used to oxidize ("ash") photoresist and facilitate its removal. Ion milling, or sputter etching, uses lower pressures, often as low as 10 −4 Torr (10 mPa). It bombards the wafer with energetic ions of noble gases, often Ar +, which knock atoms from the substrate by transferring momentum. Because the etching is ...
Ion beam analysis has found use in a number of variable applications, ranging from biomedical uses to studying ancient artifacts. The popularity of this technique stems from the sensitive data that can be collected without significant distortion to the system on which it is studying.
The four research areas of the IOM are supported by cross-sectional units with cross-sectional tasks. Each cross-sectional unit is managed independently in organisational terms. The current cross-section units are: Modelling and simulation. In this unit, the experimental work within the institute is accompanied and optimised by mathematical ...
An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely used ion beams are of singly-charged ions.
Gas cluster ion beams (GCIB) is a technology for nano-scale modification of surfaces. It can smooth a wide variety of surface material types to within an angstrom of roughness without subsurface damage. It is also used to chemically alter surfaces through infusion or deposition.
Manufacturers of substrates used in electronics prepare cross sections of a final product for quality assurance. [8] In cross section, the quality of drill holes can be assessed and the plating quality and thickness in vias can be measured. Voids in the substrate materials may be seen which show the quality of the lamination process.