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Dimethyldichlorosilane is a tetrahedral organosilicon compound with the formula Si(CH 3) 2 Cl 2. At room temperature it is a colorless liquid that readily reacts with water to form both linear and cyclic Si-O chains. Dimethyldichlorosilane is made on an industrial scale as the principal precursor to dimethylsilicone and polysilane compounds.
Methyltrichlorosilane, also known as trichloromethylsilane, is a monomer and organosilicon compound with the formula CH 3 SiCl 3. It is a colorless liquid with a sharp odor similar to that of hydrochloric acid. As methyltrichlorosilane is a reactive compound, it is mainly used a precursor for forming various cross-linked siloxane polymers.
Bis(triphenylphosphine)palladium chloride is a coordination compound of palladium containing two triphenylphosphine and two chloride ligands. It is a yellow solid that is soluble in some organic solvents.
David R. Lide (ed), CRC Handbook of Chemistry and Physics, 84th Edition. CRC Press. Boca Raton, Florida, 2003; Section 4, Properties of the Elements and Inorganic Compounds; Density of Molten Elements and Representative Salts
CH 4 + Cl 2 → CH 3 Cl + HCl CH 3 Cl + Cl 2 → CH 2 Cl 2 + HCl CH 2 Cl 2 + Cl 2 → CHCl 3 + HCl CHCl 3 + Cl 2 → CCl 4 + HCl. The output of these processes is a mixture of chloromethane, dichloromethane, chloroform, and carbon tetrachloride as well as hydrogen chloride as a byproduct. These compounds are separated by distillation.
This group consists of three methyl groups bonded to a silicon atom [−Si(CH 3) 3], which is in turn bonded to the rest of a molecule. This structural group is characterized by chemical inertness and a large molecular volume , which makes it useful in a number of applications.
Trimethylsilyl chloride, also known as chlorotrimethylsilane is an organosilicon compound (silyl halide), with the formula (CH 3) 3 SiCl, often abbreviated Me 3 SiCl or TMSCl. It is a colourless volatile liquid that is stable in the absence of water. It is widely used in organic chemistry.
Dichlorosilane, or DCS as it is commonly known, is a chemical compound with the formula H 2 SiCl 2. In its major use, it is mixed with ammonia (NH 3) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration of DCS·NH 3 (i.e. 16:1), usually results in lower stress nitride films.