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Canon Inc. (Japanese: キヤノン株式会社; [ note 1 ] Hepburn: Kyanon kabushiki gaisha) is a Japanese multinational corporation headquartered in Ōta, Tokyo, specializing in optical, imaging, and industrial products, such as lenses, cameras, medical equipment, scanners, printers, and semiconductor manufacturing equipment. [ 4 ]
ASML Holding N.V. (commonly shortened to ASML, originally standing for Advanced Semiconductor Materials Lithography) is a Dutch multinational corporation founded in 1984. ASML specializes in the development and manufacturing of photolithography machines which are used to produce computer chips. As of 2023 it is the largest supplier for the ...
Extreme ultraviolet lithography. Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses extreme ultraviolet (EUV) light to create intricate patterns on silicon wafers.
Nanoimprint lithography (NIL) is a method of fabricating nanometer -scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by ...
Electron-beam lithography (often abbreviated as e-beam lithography or EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). [1] The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or ...
Optical Lithography (or photolithography) is one of the most important and prevalent sets of techniques in the nanolithography field. Optical lithography contains several important derivative techniques, all that use very short light wavelengths in order to change the solubility of certain molecules, causing them to wash away in solution, leaving behind a desired structure.
Immersion lithography is a technique used in semiconductor manufacturing to enhance the resolution and accuracy of the lithographic process. It involves using a liquid medium, typically water, between the lens and the wafer during exposure. By using a liquid with a higher refractive index than air, immersion lithography allows for smaller ...
Carl Zeiss SMT systems for DUV and EUV electromagnetic radiation are used in chip-lithography machines for focusing the extremely short wavelengths. [58] Together with the company ASML and its subsidiaries and partners Zeiss is the sole supplier of the lithography systems that are able to manufacture core layers of the latest semiconductor chips.