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Hydrofluoric acid is a solution of hydrogen fluoride (HF) in water. Solutions of HF are colorless, acidic and highly corrosive. A common concentration is 49% (48-52%) but there are also stronger solutions (e.g. 70%) and pure HF has a boiling point near room temperature.
Due to strong and extensive hydrogen bonding, it boils at near room temperature, much higher than other hydrogen halides. Hydrogen fluoride is an extremely dangerous gas, forming corrosive and penetrating hydrofluoric acid upon contact with moisture. The gas can also cause blindness by rapid destruction of the corneas.
A hydrofluoric acid burn is a chemical burn from hydrofluoric acid. [1] Where it contacts the skin it results in significant pain, swelling, redness, and skin breakdown. [1][2] If the fumes are breathed in swelling of the upper airway and bleeding may occur. [2] Complications can include electrolyte, heart, lung, kidney, and neurological ...
An alkylation unit (alky) is one of the conversion processes used in petroleum refineries. It is used to convert isobutane and low-molecular-weight alkenes (primarily a mixture of propene and butene) into alkylate, a high octane gasoline component. The process occurs in the presence of an acid such as sulfuric acid (H 2 SO 4) or hydrofluoric ...
UF 6 reacts with water, releasing hydrofluoric acid. The compound reacts with aluminium, forming a surface layer of AlF 3 that resists any further reaction from the compound. Uranium hexafluoride is a mild oxidant. [10] It is a Lewis acid as evidenced by its binding to form heptafluorouranate(VI), [UF 7] −. [11]
Organofluorine compounds are pervasive. Many drugs, many polymers, refrigerants, and many inorganic compounds are made from fluoride-containing reagents. Often fluorides are converted to hydrogen fluoride, which is a major reagent and precursor to reagents. Hydrofluoric acid and its anhydrous form, hydrogen fluoride, are particularly important. [4]
Buffered oxide etch. Buffered oxide etch (BOE), also known as buffered HF or BHF, is a wet etchant used in microfabrication. It is a mixture of a buffering agent, such as ammonium fluoride NH4F, and hydrofluoric acid (HF). Its primary use is in etching thin films of silicon nitride (Si 3 N 4) or silicon dioxide (SiO 2), by the reaction:
Sodium bifluoride reacts with water or moist skin to produce hydrofluoric acid. It also gives off hydrofluoric acid and hydrogen gas when it is heated to a gaseous state. The chemical can decompose upon contact with strong acids, strong bases, metal, water, or glass. [3] Sodium bifluoride also engages in violent reactions with chromyl chloride ...
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