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  2. Direct bonding - Wikipedia

    en.wikipedia.org/wiki/Direct_bonding

    The procedural steps of the direct bonding process of wafers any surface is divided into wafer preprocessing, pre-bonding at room temperature and; annealing at elevated temperatures. Even though direct bonding as a wafer bonding technique is able to process nearly all materials, silicon is the most established material up to now. Therefore, the ...

  3. Plasma-activated bonding - Wikipedia

    en.wikipedia.org/wiki/Plasma-activated_bonding

    Plasma-activated bonding is a derivative, directed to lower processing temperatures for direct bonding with hydrophilic surfaces. The main requirements for lowering temperatures of direct bonding are the use of materials melting at low temperatures and with different coefficients of thermal expansion (CTE) .

  4. Delta model - Wikipedia

    en.wikipedia.org/wiki/Delta_model

    The delta model can be illustrated using the strategic triangle (see fig.1). There are three points: system lock-in, best customer solutions and best product. [8] System lock- in enables market dominance and can achieve complementor share, it focuses on the entire system economics and instead of product-centered economics, which makes it very sustainable. [9]

  5. Category:Wafer bonding - Wikipedia

    en.wikipedia.org/wiki/Category:Wafer_bonding

    Wafer bonding is a packaging technology for materials integration as well as for hermetic sealing and encapsulation. This method describes the process for all suitable bonding techniques that enable the contacting of two or more wafers.

  6. Anodic bonding - Wikipedia

    en.wikipedia.org/wiki/Anodic_bonding

    Anodic bonding is commonly used to seal glass to silicon wafers in electronics and microfluidics. Anodic bonding, also known as field assisted bonding or electrostatic sealing, [1] is mostly used for connecting silicon/glass and metal/glass through electric fields. The requirements for anodic bonding are clean and even wafer surfaces and atomic ...

  7. Surface activated bonding - Wikipedia

    en.wikipedia.org/wiki/Surface_activated_bonding

    Surface activated bonding (SAB) is a non-high-temperature wafer bonding technology with atomically clean and activated surfaces. Surface activation prior to bonding by using fast atom bombardment is typically employed to clean the surfaces. High-strength bonding of semiconductors, metals, and dielectrics can be obtained even at room temperature ...

  8. Why Diversity Matters Catalyst 7-16-12 - HuffPost

    images.huffingtonpost.com/2013-03-21-why...

    goals.1 Effective business cases set the context for diversity and identify organizational challenges that must be addressed in order to create change. This tool grounds the business case for diversity in solid research. It is not a bibliography of business case research, but it is intended to provide readers, including D&I practitioners,

  9. Wafer bonding - Wikipedia

    en.wikipedia.org/wiki/Wafer_bonding

    Wafer bonding is a packaging technology on wafer-level for the fabrication of microelectromechanical systems (MEMS), nanoelectromechanical systems (NEMS), microelectronics and optoelectronics, ensuring a mechanically stable and hermetically sealed encapsulation. The wafers' diameter range from 100 mm to 200 mm (4 inch to 8 inch) for MEMS/NEMS ...