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  2. Glass etching - Wikipedia

    en.wikipedia.org/wiki/Glass_etching

    Glass etching, or " French embossing ", is a popular technique developed during the mid-1800s that is still widely used in both residential and commercial spaces today. Glass etching comprises the techniques of creating art on the surface of glass by applying acidic, caustic, or abrasive substances. Traditionally this is done after the glass is ...

  3. Potassium fluoride - Wikipedia

    en.wikipedia.org/wiki/Potassium_fluoride

    Potassium fluoride is the chemical compound with the formula KF. ... Solutions of KF will etch glass due to the formation of soluble fluorosilicates, ...

  4. Chemical milling - Wikipedia

    en.wikipedia.org/wiki/Chemical_milling

    A high-purity (≥99.9998%) aluminium bar that has been etched to reveal the component crystallites. Chemical milling or industrial etching is the subtractive manufacturing process of using baths of temperature-regulated etching chemicals to remove material to create an object with the desired shape. [1][2] Other names for chemical etching ...

  5. Etching - Wikipedia

    en.wikipedia.org/wiki/Etching

    Etching by Daniel Hopfer, who is believed to have been the first to apply the technique to printmaking. Etching is traditionally the process of using strong acid or mordant to cut into the unprotected parts of a metal surface to create a design in intaglio (incised) in the metal. [1] In modern manufacturing, other chemicals may be used on other ...

  6. Etching (microfabrication) - Wikipedia

    en.wikipedia.org/wiki/Etching_(microfabrication)

    Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which ...

  7. Hydrofluoric acid - Wikipedia

    en.wikipedia.org/wiki/Hydrofluoric_acid

    Wet etching tanks. It is used in the semiconductor industry as a major component of Wright etch and buffered oxide etch, which are used to clean silicon wafers. In a similar manner it is also used to etch glass by treatment with silicon dioxide to form gaseous or water-soluble silicon fluorides. It can also be used to polish and frost glass. [5]

  8. Piranha solution - Wikipedia

    en.wikipedia.org/wiki/Piranha_solution

    Piranha solution, also known as piranha etch, is a mixture of sulfuric acid (H2SO4) and hydrogen peroxide (H2O2). The resulting mixture is used to clean organic residues off substrates, for example silicon wafers. [1] Because the mixture is a strong oxidizing agent, it will decompose most organic matter, and it will also hydroxylate most ...

  9. Photoresist - Wikipedia

    en.wikipedia.org/wiki/Photoresist

    Physical, chemical, and optical properties of photoresists influence their selection for different processes. [13] The primary properties of the photoresist are resolution capability, process dose and focus latitudes required for curing, and resistance to reactive ion etching.

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