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An illustration of OPC (Optical Proximity Correction). The blue Γ-like shape is what chip designers would like printed on a wafer, in green is the pattern on a mask after applying optical proximity correction, and the red contour is how the shape actually prints on the wafer (quite close to the desired blue target).
In photolithography, several masks are used in turn, each one reproducing a layer of the completed design, and together known as a mask set. A curvilinear photomask has patterns with curves, which is a departure from conventional photomasks which only have patterns that are completely vertical or horizontal, known as manhattan geometry.
Open Artwork System Interchange Standard (OASIS [3]) is a binary file format used for specification of data structures for photomask production. [4] It's used to represent a pattern an interchange and encapsulation format for hierarchical integrated circuit mask layout information produced during integrated circuit design that is further used for manufacturing of a photomask.
Visual masking involves surrounding a target image (here, the word "radio") with another image. Visual masking is a phenomenon of visual perception. It occurs when the visibility of one image, called a target, is reduced by the presence of another image, called a mask. [1] The target might be invisible or appear to have reduced contrast or ...
In image processing, a kernel, convolution matrix, or mask is a small matrix used for blurring, sharpening, embossing, edge detection, and more. This is accomplished by doing a convolution between the kernel and an image .
For image processing, deconvolution is the process of approximately inverting the process that caused an image to be blurred. Specifically, unsharp masking is a simple linear image operation—a convolution by a kernel that is the Dirac delta minus a gaussian blur kernel.
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