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  2. Focused ion beam - Wikipedia

    en.wikipedia.org/wiki/Focused_ion_beam

    Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM).

  3. Probe tip - Wikipedia

    en.wikipedia.org/wiki/Probe_Tip

    Focused ion and electron beam techniques for the fabrication of strong, stable, reproducible Si 3 N 4 pyramidal tips with 1.0 μm length and 0.1 μm diameter were reported by Russell in 1992. [6] Significant advancement also came through the introduction of micro-fabrication methods for the creation of precise conical or pyramidal silicon and ...

  4. List of materials analysis methods - Wikipedia

    en.wikipedia.org/wiki/List_of_materials_analysis...

    FEM – Field emission microscopy; FIB – Focused ion beam microscopy; ... Focused Ion Beam Systems: Basics and Applications. Cambridge, UK: Cambridge University Press.

  5. Electron beam-induced deposition - Wikipedia

    en.wikipedia.org/wiki/Electron_beam-induced...

    Another method is ion-beam-induced deposition (IBID), where a focused ion beam is applied instead. Precursor materials are typically liquid or solid and gasified prior to deposition, usually through vaporization or sublimation, and introduced, at accurately controlled rate, into the high-vacuum chamber of the electron microscope. Alternatively ...

  6. Ion beam analysis - Wikipedia

    en.wikipedia.org/wiki/Ion_beam_analysis

    The configuration of the ion beam apparatus can be changed and made more complex with the incorporation of additional components. The techniques for ion beam analysis are designed for specific purposes. Some techniques and ion sources are shown in table 1. Detector types and arrangements for ion beam techniques are shown in table 2.

  7. Maskless lithography - Wikipedia

    en.wikipedia.org/wiki/Maskless_lithography

    Currently, the main forms of maskless lithography are electron beam and optical. In addition, focused ion beam (FIB) systems have established an important niche role in failure analysis and defect repair. Also, systems based on arrays of mechanical and thermally ablative probe tips have been demonstrated.

  8. Ion beam - Wikipedia

    en.wikipedia.org/wiki/Ion_beam

    Carl Zeiss Crossbeam 550 – combines a field emission scanning electron microscope (FE-SEM) with a focused ion beam (FIB). Nanofluidics channels fabricated with a Zeiss Crossbeam 550 L, in a silicon master stamp. Ion beams can be used for material modification (e.g. by sputtering or ion beam etching) and for ion beam analysis.

  9. Electron microscope - Wikipedia

    en.wikipedia.org/wiki/Electron_microscope

    An electron microscope is a microscope that uses a beam of electrons as a source of illumination. They use electron optics that are analogous to the glass lenses of an optical light microscope to control the electron beam, for instance focusing them to produce magnified images or electron diffraction patterns.