Search results
Results from the WOW.Com Content Network
Au-Si droplets on the surface of the substrate act to lower the activation energy of normal vapor-solid growth. For example, Si can be deposited by means of a SiCl 4:H 2 gaseous mixture reaction (chemical vapor deposition), only at temperatures above 800 °C, in normal vapor-solid growth. Moreover, below this temperature almost no Si is ...
Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films .
Chemical vapor deposition techniques (10 P) Pages in category "Chemical vapor deposition" The following 4 pages are in this category, out of 4 total.
This category is being considered for merging into Category:Chemical vapor deposition. This does not mean that any of the pages in the category will be deleted. They may, however, be recategorized. Please share your thoughts on the matter at this category's entry on the Categories for discussion page. Please do not empty the category or remove ...
Figure 1. Conventional Chemical Vapour Infiltration. [3]• Matrix material carried by the gas ↑ Carrier gas Not drawn to scale CVI growth. Figure 2. [3]During chemical vapour infiltration, the fibrous preform is supported on a porous metallic plate through which a mixture of carrier gas along with matrix material is passed at an elevated temperature.
The island growth model is used to explain how fast deposition techniques (such as sputter deposition) can produce films with many randomly oriented grains, whereas slow deposition techniques (such as MBE) tend to produce larger grains with more uniform structure.
Plasma-enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition process used to deposit thin films from a gas state to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases.
Solvent-free methods, such as ball-milling or chemical vapor deposition, have also been described to produce high-quality ZIF-8. [ 32 ] [ 33 ] Chemical vapor deposition is of particular promise due to the high degree of uniformity and aspect ratio control it can offer, and its ability to be integrated into traditional lithographic workflows for ...