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Molar mass: 140.283 g·mol −1 Appearance grey, odorless powder [2] ... Silicon nitride is a chemical compound of the elements silicon and nitrogen. Si 3 N 4 ...
Molar mass: 101.007 g mol −1 Appearance Colourless gas Density: 4.228 g cm −3: ... (NH 3) in LPCVD chambers to grow silicon nitride in semiconductor processing.
Boron nitride tubules were first made in 1989 by Shore and Dolan This work was patented in 1989 and published in 1989 thesis (Dolan) and then 1993 Science. The 1989 work was also the first preparation of amorphous BN by B-trichloroborazine and cesium metal. Boron nitride nanotubes were predicted in 1994 [89] and experimentally discovered in ...
Silicon oxynitride is a ceramic material with the chemical formula SiO x N y.While in amorphous forms its composition can continuously vary between SiO 2 and Si 3 N 4 (silicon nitride), the only known intermediate crystalline phase is Si 2 N 2 O. [2] It is found in nature as the rare mineral sinoite in some meteorites and can be synthesized in the laboratory.
A reported silicon phosphide is Si 12 P 5 (no practical applications), [89] [90] formed by annealing an amorphous Si-P alloy. The arsenic–silicon phase diagram measured at 40 Bar has two phases: SiAs and SiAs 2. [91] The antimony–silicon system comprises a single eutectic close to the melting point of Sb. [92] The bismuth system is a ...
Silicon is the eighth most common element in the universe by mass, but very rarely occurs in its pure form in the Earth's crust. It is widely distributed throughout space in cosmic dusts , planetoids , and planets as various forms of silicon dioxide (silica) or silicates .
Triphosphorus pentanitride reacts with lithium nitride and calcium nitride to form the corresponding salts of PN 7− 4 and PN 4− 3. Heterogenous ammonolyses of triphosphorus pentanitride gives imides such as HPN 2 and HP 4 N 7. It has been suggested that these compounds may have applications as solid electrolytes and pigments. [6]
[15] [16] Above 420 °C (788 °F), silane decomposes into silicon and hydrogen; it can therefore be used in the chemical vapor deposition of silicon. The Si–H bond strength is around 384 kJ/mol, which is about 20% weaker than the H–H bond in H 2. Consequently, compounds containing Si–H bonds are much more reactive than is H 2.