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The temperature range for process annealing ranges from 260 °C (500 °F) to 760 °C (1400 °F), depending on the alloy in question. This process is mainly suited for low-carbon steel. The material is heated up to a temperature just below the lower critical temperature of steel.
The recrystallization temperature is temperature at which recrystallization can occur for a given material and processing conditions. This is not a set temperature and is dependent upon factors including the following: [3] Increasing annealing time decreases recrystallization temperature
For example, 10% final concentration of DMSO in the PCR mixture with Phusion decreases primer annealing temperature (i.e. primer melting temperature) by 5.5–6.0 °C (9.9–10.8 °F). [26] It is well known as a reversible cell cycle arrester at phase G1 of human lymphoid cells. [27]
[62] [63] A fifth variant is a polymerase adsorbed on latex beads via hydrophobic effects, which dissolves with increasing temperature. In the sixth and oldest variant, the reaction mixture without polymerase is coated with wax and the polymerase is added on top of the cooled wax. When heated, the wax layer melts and the polymerase mixes with ...
Inspector at the cool end of a lehr. In the manufacture of float glass, a lehr oven is a long kiln with an end-to-end temperature gradient, which is used for annealing newly made glass objects that are transported through the temperature gradient either on rollers or on a conveyor belt.
The annealing temperature during a polymerase chain reaction determines the specificity of primer annealing. The melting point of the primer sets the upper limit on annealing temperature. At temperatures just above this point, only very specific base pairing between the primer and the template will occur.
Precipitation strengthening is possible if the line of solid solubility slopes strongly toward the center of a phase diagram.While a large volume of precipitate particles is desirable, a small enough amount of the alloying element should be added so that it remains easily soluble at some reasonable annealing temperature.
During ion implantation process, the crystal substrate is damaged due to bombardment with high energy ions. The damage caused can be repaired by subjecting the crystal to high temperature. This process is called annealing. Furnace anneals may be integrated into other furnace processing steps, such as oxidations, or may be processed on their own.