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Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM).
Electron-beam-induced deposition (EBID) is a process of decomposing gaseous molecules by an electron beam leading to deposition of non-volatile fragments onto a nearby substrate. The electron beam is usually provided by a scanning electron microscope , which results in high spatial accuracy (potentially below one nanometer) and the possibility ...
EBIC – Electron beam induced current (see IBIC: ion beam induced charge) EBS – Elastic (non-Rutherford) backscattering spectrometry (see RBS) EBSD – Electron backscatter diffraction; ECOSY – Exclusive correlation spectroscopy; ECT – Electrical capacitance tomography; EDAX – Energy-dispersive analysis of x-rays
A small ion beam rocket being tested by NASA. An ion beam is a beam of ions, a type of charged particle beam. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. There are many ion beam sources, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most widely ...
The configuration of the ion beam apparatus can be changed and made more complex with the incorporation of additional components. The techniques for ion beam analysis are designed for specific purposes. Some techniques and ion sources are shown in table 1. Detector types and arrangements for ion beam techniques are shown in table 2.
A scanning helium ion microscope (SHIM, HeIM or HIM) is an imaging technology based on a scanning helium ion beam. [2] Similar to other focused ion beam techniques, it allows to combine milling and cutting of samples with their observation at sub-nanometer resolution. [3] In terms of imaging, SHIM has several advantages over the traditional ...
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2] In the ion source ...
The term itself was coined by Golovchenko and co-workers at Harvard in the paper "Ion-beam sculpting at nanometer length scales." [ 1 ] In the process, solid-state nanopores are formed by lateral mass transport about the surface of the substrate, not simply by sputtering , which is the removal of material from the surface.