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  2. Electron-beam physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_physical...

    Electron-beam physical vapor deposition, or EBPVD, is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous phase.

  3. Electron beam-induced deposition - Wikipedia

    en.wikipedia.org/wiki/Electron_beam-induced...

    Electron-beam-induced deposition (EBID) is a process of decomposing gaseous molecules by an electron beam leading to deposition of non-volatile fragments onto a nearby substrate. The electron beam is usually provided by a scanning electron microscope , which results in high spatial accuracy (potentially below one nanometer) and the possibility ...

  4. Category:Thin film deposition - Wikipedia

    en.wikipedia.org/wiki/Category:Thin_film_deposition

    Download as PDF; Printable version; ... Metal plating (1 C, 34 P) P. Physical vapor deposition ... Electron-beam physical vapor deposition;

  5. Electron-beam technology - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_technology

    Electron beam technology is used in cable-isolation treatment, in electron lithography of sub-micrometer and nano-dimensional images, in microelectronics for electron-beam curing of color printing [1] and for the fabrication and modification of polymers, including liquid-crystal films, among many other applications.

  6. Electron-beam processing - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_processing

    The basic components of a typical electron-beam processing device include: [1] an electron gun (consisting of a cathode, grid, and anode), used to generate and accelerate the primary beam; and, a magnetic optical (focusing and deflection) system, used for controlling the way in which the electron beam impinges on the material being processed ...

  7. Low-energy electron diffraction - Wikipedia

    en.wikipedia.org/wiki/Low-energy_electron...

    Also seen is the electron gun that generates the primary electron beam; it covers up parts of the screen. Low-energy electron diffraction ( LEED ) is a technique for the determination of the surface structure of single-crystalline materials by bombardment with a collimated beam of low-energy electrons (30–200 eV) [ 1 ] and observation of ...

  8. Topological insulator - Wikipedia

    en.wikipedia.org/wiki/Topological_insulator

    Topological insulators can be grown using different methods such as metal-organic chemical vapor deposition (MOCVD), [67] physical vapor deposition (PVD), [68] solvothermal synthesis, [69] sonochemical technique [70] and molecular beam epitaxy. Schematic of the components of a MBE system (MBE). [34] MBE has so far been the most common ...

  9. Focused ion beam - Wikipedia

    en.wikipedia.org/wiki/Focused_ion_beam

    Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM).