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2. Piranha solution - Wikipedia

   en.wikipedia.org/wiki/Piranha_solution

   Piranha solution

3. RCA clean - Wikipedia

   en.wikipedia.org/wiki/RCA_clean

   RCA clean - Wikipedia ... RCA clean

4. Etching (microfabrication) - Wikipedia

   en.wikipedia.org/wiki/Etching_(microfabrication)

   Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer ...

5. Piranha etch - Wikipedia

   en.wikipedia.org/?title=Piranha_etch&redirect=no

   This page was last edited on 6 August 2007, at 19:43 (UTC).; Text is available under the Creative Commons Attribution-ShareAlike License 4.0; additional terms may ...

6. Aqua regia - Wikipedia

   en.wikipedia.org/wiki/Aqua_regia

   Aqua regia - Wikipedia ... Aqua regia

7. Plasma cleaning - Wikipedia

   en.wikipedia.org/wiki/Plasma_cleaning

   Plasma cleaning. Fig. 1. The surface of a MEMS device is cleaned with bright, blue oxygen plasma in a plasma etcher to rid it of carbon contaminants. (100mTorr, 50W RF) Plasma cleaning is the removal of impurities and contaminants from surfaces through the use of an energetic plasma or dielectric barrier discharge (DBD) plasma created from ...

8. Peroxymonosulfuric acid - Wikipedia

   en.wikipedia.org/wiki/Peroxymonosulfuric_acid

   Peroxymonosulfuric acid

9. Glass ionomer cement - Wikipedia

   en.wikipedia.org/wiki/Glass_ionomer_cement

   Glass ionomer cement