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Piranha solution
RCA clean - Wikipedia ... RCA clean
Etching tanks used to perform Piranha, hydrofluoric acid or RCA clean on 4-inch wafer batches at LAAS technological facility in Toulouse, France. Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer ...
This page was last edited on 6 August 2007, at 19:43 (UTC).; Text is available under the Creative Commons Attribution-ShareAlike License 4.0; additional terms may ...
Plasma cleaning. Fig. 1. The surface of a MEMS device is cleaned with bright, blue oxygen plasma in a plasma etcher to rid it of carbon contaminants. (100mTorr, 50W RF) Plasma cleaning is the removal of impurities and contaminants from surfaces through the use of an energetic plasma or dielectric barrier discharge (DBD) plasma created from ...
Sodium treated PTFE will degrade with exposure to UV radiation. Immediately after sodium treatment, the PTFE surface is dark brown. The weaker the etching solution, the lighter the color change and the weaker the bond will be. [1] When exposed to UV radiation, the treated PTFE will gradually return to its original white color.
Semiconductor device fabrication
Peroxymonosulfuric acid
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