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An excimer laser. An excimer laser, sometimes more correctly called an exciplex laser, is a form of ultraviolet laser which is commonly used in the production of microelectronic devices, semiconductor based integrated circuits or "chips", eye surgery, and micromachining.
The argon fluoride laser (ArF laser) is a particular type of excimer laser, [1] which is sometimes (more correctly) called an exciplex laser. With its 193-nanometer wavelength, it is a deep ultraviolet laser, which is commonly used in the production of semiconductor integrated circuits, eye surgery, micromachining, and scientific research.
A krypton fluoride laser (KrF laser) is a particular type of excimer laser, [1] which is sometimes (more correctly) called an exciplex laser. With its 248 nanometer wavelength, it is a deep ultraviolet laser which is commonly used in the production of semiconductor integrated circuits , industrial micromachining, and scientific research.
Flashlamp, laser diode Mostly used for pulsed pumping of certain types of pulsed Ti:sapphire lasers, combined with frequency doubling. Neodymium-doped yttrium orthovanadate (Nd:YVO 4) laser 1.064 μm laser diode Mostly used for continuous pumping of mode-locked Ti:sapphire or dye lasers, in combination with frequency doubling. Also used pulsed ...
The commonly used deep ultraviolet excimer lasers in lithography systems are the krypton fluoride (KrF) laser at 248 nm wavelength and the argon fluoride laser (ArF) at 193 nm wavelength. The primary manufacturers of excimer laser light sources in the 1980s were Lambda Physik (now part of Coherent, Inc.) and Lumonics.
Commonly used excimer molecules include ArF (emission at 193 nm), KrCl (222 nm), KrF (248 nm), XeCl (308 nm), and XeF (351 nm). [69] [page needed] The molecular fluorine laser, emitting at 157 nm in the vacuum ultraviolet, is sometimes referred to as an excimer laser; however, this appears to be a misnomer since F 2 is a stable compound.
These lasers take advantage of the fact that excimer components have attractive interactions in the excited state and repulsive interactions in the ground state. Emission of excimer molecules is also used as a source of spontaneous ultraviolet light (excimer lamps). [2]
Meanwhile, experiments in 1970 using a xenon dimer and in 1975 using noble gas halides resulted in the invention of a type of laser called an excimer laser. While excimer lasers were initially used for industrial purposes, in 1980, Rangaswamy Srinivasan, a scientist of IBM who was using an excimer laser to make microscopic circuits in ...