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  2. Selected area diffraction - Wikipedia

    en.wikipedia.org/wiki/Selected_area_diffraction

    Single-crystalline SADP automatically interpreted with CrysTBox software. SAD analysis is widely used in material research for its relative simplicity and high information value. Once the sample is prepared and examined in a modern transmission electron microscope, the device allows for a routine diffraction acquisition in a matter of seconds.

  3. SADP - Wikipedia

    en.wikipedia.org/wiki/SADP

    SADP may refer to : Science and Technology. Self-Aligned Double-Patterning, a Multiple patterning technique used in semiconductor manufacturing; Selected Area Diffraction Pattern, the pattern of spots in Selected area diffraction; sADP, "slow after depolarizing current", an experimental response of Neurons; Other

  4. Multiple patterning - Wikipedia

    en.wikipedia.org/wiki/Multiple_patterning

    Compared to 193i SADP, EUV SADP cost is dominated by the EUV tool exposure, while the 193i SAQP cost difference is from the added depositions and etches. The processing cost and yield loss at a lithographic tool is expected to be highest in the whole integrated process flow due to the need to move the wafer to specific locations at high speed.

  5. Download, install, or uninstall AOL Desktop Gold - AOL Help

    help.aol.com/articles/aol-desktop-downloading...

    Learn how to download and install or uninstall the Desktop Gold software and if your computer meets the system requirements.

  6. Spacer patterning - Wikipedia

    en.wikipedia.org/wiki/Spacer_patterning

    This resolution improvement technique is also known as Self-Aligned Double Patterning (SADP). SADP may be re-applied for even higher resolution, and has already been demonstrated for 15 nm NAND flash memory. [1] Spacer patterning has also been adopted for sub-20 nm logic nodes, e.g., 14 nm and 10 nm. At advanced nodes, spacer-based patterning ...

  7. IM Flash Technologies - Wikipedia

    en.wikipedia.org/wiki/IM_Flash_Technologies

    IM Flash has been able to devise 25-nm NAND chips with 193-nm immersion lithography, plus self-aligned double-patterning (SADP) techniques, where it is widely believed that it is using scanners from ASML Holdings NV and SADP technology. [3] In 2011 IM Flash moved to a 20 nm process– which was the smallest NAND flash technology at the time. [4]

  8. Beyoncé course coming to Yale University to examine her legacy

    www.aol.com/beyonc-course-coming-yale-university...

    Beyoncé Knowles-Carter will not only go down in history books; now the record-breaking superstar and her legacy will be the subject of a new course at Yale University.. The single-credit course ...

  9. Service data adaptation protocol - Wikipedia

    en.wikipedia.org/wiki/Service_data_adaptation...

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