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electron-electron scattering Bhabha scattering: electron-positron scattering Penguin diagram: a quark changes flavor via a W or Z loop Tadpole diagram: One loop diagram with one external leg Self-interaction or oyster diagram An electron emits and reabsorbs a photon Box diagram The box diagram for kaon oscillations: Photon-photon scattering
A simple machine is a mechanical device that changes the direction or magnitude of a force. [1] In general, they can be defined as the simplest mechanisms that use mechanical advantage (also called leverage) to multiply force. [2] Usually the term refers to the six classical simple machines that were defined by Renaissance scientists: [3] [4 ...
For example, in the process of electron-positron annihilation the initial state is one electron and one positron, while the final state is two photons. Conventionally, the initial state is at the left of the diagram and the final state at the right (although other layouts are also used).
The hand axe is the first example of a wedge, the oldest of the six classic simple machines, from which most machines are based. The second oldest simple machine was the inclined plane (ramp), [6] which has been used since prehistoric times to move heavy objects. [7] [8] The other four simple machines were invented in the ancient Near East. [9]
Modern 3D Lichtenberg figures or "electrical treeing" in a block of clear acrylic, created by irradiating the block with an electron beam.Actual size: 80 mm × 80 mm × 50 mm (3 in × 3 in × 2 in) Lichtenberg figures are generated by a sliding spark discharge on the flask with a mixture of gases.
For example, renormalization in QED modifies the mass of the free field electron to match that of a physical electron (with an electromagnetic field), and will in doing so add a term to the free field Lagrangian which must be cancelled by a counterterm in the interaction Lagrangian, that then shows up as a two-line vertex in the Feynman diagrams.
An example of Electron beam lithograph setup. Electron-beam lithography (often abbreviated as e-beam lithography or EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). [1]
In the context of electron transfer, these groups enhance the oxidizing power tendency of the attached species. For example, Tetracyanoethylene serves as an oxidant due to its attachment to four cyano substituents, which are electron-withdrawing groups. [5] Oxidants with EWGs are stronger than the parent compound.
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