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The act of applying a thin film to a surface is thin-film deposition – any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. "Thin" is a relative term, but most deposition techniques control layer thickness within a few tens of nanometres .
Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals called precursors (also called "reactants"). These precursors react with the surface of a material one at a time in a ...
Layer-by-layer (LbL) deposition is a thin film fabrication technique. The films are formed by depositing alternating layers of complementary materials with wash steps in between. This can be accomplished by using various techniques such as immersion, spin, spray, electromagnetism, or fluidics. [1]
Molecular-beam epitaxy takes place in high vacuum or ultra-high vacuum (10 −8 –10 −12 Torr).The most important aspect of an MBE process is the deposition rate (typically less than 3,000 nm per hour) that allows the films to grow epitaxially (in layers on top of the existing crystal).
Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...
The deposition of copper films by HIPIMS was reported for the first time by V. Kouznetsov for the application of filling 1 μm vias with aspect ratio of 1:1.2 [10] Transition metal nitride (CrN) thin films were deposited by HIPIMS for the first time in February 2001 by A.P. Ehiasarian. [ 11 ]
Chemical Bath Deposition has a long history but until recently was an uncommon method of thin-film deposition. [1]In 1865, Justus Liebig published an article describing the use of Chemical Bath Deposition to silver mirrors (to affix a reflective layer of silver to the back of glass to form a mirror), [5] though in the modern day electroplating and vacuum deposition are more common.
Illustration of the process. Metalorganic vapour-phase epitaxy (MOVPE), also known as organometallic vapour-phase epitaxy (OMVPE) or metalorganic chemical vapour deposition (MOCVD), [1] is a chemical vapour deposition method used to produce single- or polycrystalline thin films.