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2. Physical vapor deposition - Wikipedia

   en.wikipedia.org/wiki/Physical_vapor_deposition

   Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

3. Titanium nitride - Wikipedia

   en.wikipedia.org/wiki/Titanium_nitride

   Titanium nitride (TiN; sometimes known as tinite) is an extremely hard ceramic material, often used as a physical vapor deposition (PVD) coating on titanium alloys, steel, carbide, and aluminium components to improve the substrate's surface properties.

4. Cathodic arc deposition - Wikipedia

   en.wikipedia.org/wiki/Cathodic_arc_deposition

   Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films.

5. Ion plating - Wikipedia

   en.wikipedia.org/wiki/Ion_plating

   Ion plating (IP) is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a modified version of vacuum deposition. Ion plating uses concurrent or periodic bombardment of the substrate, and deposits film by atomic-sized energetic particles called ions.

6. Electron-beam physical vapor deposition - Wikipedia

   en.wikipedia.org/wiki/Electron-beam_physical...

   The PVD process can be carried out at lower deposition temperatures and without corrosive products, but deposition rates are typically lower. Electron-beam physical vapor deposition, however, yields a high deposition rate from 0.1 to 100 μm / min at relatively low substrate temperatures, with very high material utilization efficiency.

7. Sputter deposition - Wikipedia

   en.wikipedia.org/wiki/Sputter_deposition

   Sputter coating in scanning electron microscopy is a sputter deposition process [clarification needed] to cover a specimen with a thin layer of conducting material, typically a metal, such as a gold/palladium (Au/Pd) alloy. A conductive coating is needed to prevent charging of a specimen with an electron beam in conventional SEM mode (high ...

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9. Titanium aluminium nitride - Wikipedia

   en.wikipedia.org/wiki/Titanium_aluminium_nitride

   TiAlN and AlTiN coatings from pure Al and pure Ti targets by Cathodic arc deposition have been produced industrially by NanoShield PVD Thailand since 1999. By using separate target technology it is possible to offer more flexibility regarding the structure and composition of the coating. Selected properties of Al66Ti34N are: