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The 65 nm process is an advanced lithographic node used in volume CMOS semiconductor fabrication. Printed linewidths (i.e. transistor gate lengths) can reach as low as 25 nm on a nominally 65 nm process, while the pitch between two lines may be greater than 130 nm.
The technology used a 32 nm SOI process, two CPU cores per module, and up to four modules, ranging from a quad-core design costing approximately US$130 to a $280 eight-core design. Ambarella Inc. announced the availability of the A7L system-on-a-chip circuit for digital still cameras, providing 1080p60 high-definition video capabilities in ...
2 nm process; 3 nm process; 5 nm process; 7 nm process; 10 nm process; 14 nm process; 22 nm process; 32 nm process; 45 nm process; 65 nm process; 90 nm process; 130 nm process; 180 nm process; 250 nm process; 350 nm process; 600 nm process; 800 nm process; 1 μm process; 1.5 μm process; 3 μm process; 6 μm process; 10 µm process
In 2000, Gurtej Singh Sandhu and Trung T. Doan at Micron Technology invented atomic layer deposition High-κ dielectric films, leading to the development of a cost-effective 90 nm CMOS process. [41] [44] Toshiba and Sony developed a 65 nm CMOS process in 2002, [45] and then TSMC initiated the development of 45 nm CMOS logic in 2004. [46]
Process variation is the naturally occurring variation in the attributes of transistors (length, widths, oxide thickness) when integrated circuits are fabricated.The amount of process variation becomes particularly pronounced at smaller process nodes (<65 nm) as the variation becomes a larger percentage of the full length or width of the device and as feature sizes approach the fundamental ...
The reduction to 65 nm reduced the existing 230 mm 2 die based on the 90 nm process to half its current size, about 120 mm 2, greatly reducing IBM's manufacturing cost as well. On 12 March 2007, IBM announced that it started producing 65 nm Cells in its East Fishkill fab. The chips produced there are apparently only for IBMs own Cell blade ...
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reengineered P6-based microarchitecture used in Intel Core 2 and Xeon microprocessors, built on a 65 nm process, supporting x86-64 level SSE instruction and macro-op fusion and enhanced micro-op fusion with a wider front end and decoder, larger out-of-order core and renamed register, support loop stream detector and large shadow register file.