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Most 1-bromoalkanes are prepared by free-radical addition of hydrogen bromide to the 1-alkene, which is 1-pentene in the case of 1-bromopentane. These conditions lead to anti-Markovnikov addition, giving the 1-bromo derivative. [2] It is also formed by the reaction of 1-pentanol with hydrogen bromide.
β-hydride elimination occurs commonly for metal-alkyl complexes. The process transforms a metal-bound alkyl group into an alkene with the release of a metal hydride. [6] Notably, β-hydride elimination can also occur for other ligands, such as alkoxides, via similar mechanisms. Top: the β-hydride elimination of an alkyl ligand.
The name "homologous series" is also often used for any collection of compounds that have similar structures or include the same functional group, such as the general alkanes (straight and branched), the alkenes (olefins), the carbohydrates, etc. However, if the members cannot be arranged in a linear order by a single parameter, the collection ...
An enal (or alkenal) is an organic compound containing both alkene and aldehyde functional groups. In an α,β-unsaturated enal, the alkene is conjugated to the carbonyl group of the aldehyde (formyl group). [3] The simplest enal is acrolein (CH 2 =CHCHO). Other examples include cis-3-hexenal (essence of mowed lawns) and cinnamaldehyde (essence ...
in black: proton abstraction in an elimination reaction to unsaturated compound 7. When the alkene carries a methylene group, elimination and addition can be concerted with transfer of an allyl proton to the carbonyl group which in effect is an ene reaction in scheme 6. Scheme 6. Carbonyl-ene reaction versus Prins reaction
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The main limitation of the traditional Wittig reaction is that the reaction proceeds mainly via the erythro betaine intermediate, which leads to the Z-alkene. The erythro betaine can be converted to the threo betaine using phenyllithium at low temperature. [18] This modification affords the E-alkene. The Schlosser variant of the Wittig reaction
The hydrosilylation reaction can be initiated with UV light at room temperature or with heat (typical reaction temperature 120-200 °C), under moisture- and oxygen-free conditions. [7] The resulting monolayer, which is stable and inert, inhibits oxidation of the base silicon layer, relevant to various device applications.