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A number of investigations have been performed to observe the gamma-ray spectra of the Sun and other astronomical sources, both galactic and extra-galactic.The Gamma-Ray Imaging Spectrometer, the Hard X-ray/Low-Energy Gamma-ray experiment (A-4) on HEAO 1, the Burst and Transient Spectrometry Experiment (BATSE) and the OSSI (Oriented Scintillation Spectrometer Experiment) on CGRO, the C1 ...
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
X-ray generators produce X-rays by applying a high voltage between the cathode and the anode of an X-ray tube and in heating the tube filament to start the electron emission. The electrons are then accelerated in the resulting electric potential and collide with the anode, which is usually made of Tungsten .