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One procedure for acid-base neutralization consists in pouring the piranha solution into a sufficiently large glass container filled with at least five times the solution's mass of ice (for cooling the exothermic reaction, and also for dilution purposes), then slowly adding 1M sodium or potassium hydroxide solution until neutralized.
186 etched glass at Bankfield Museum. Glass etching, or " French embossing ", is a popular technique developed during the mid-1800s that is still widely used in both residential and commercial spaces today. Glass etching comprises the techniques of creating art on the surface of glass by applying acidic, caustic, or abrasive substances.
Infobox references. Potassium fluoride is the chemical compound with the formula KF. After hydrogen fluoride, KF is the primary source of the fluoride ion for applications in manufacturing and in chemistry. It is an alkali halide salt and occurs naturally as the rare mineral carobbiite.
Buffered oxide etch (BOE), also known as buffered HF or BHF, is a wet etchant used in microfabrication. It is a mixture of a buffering agent, such as ammonium fluoride NH4F, and hydrofluoric acid (HF). Its primary use is in etching thin films of silicon nitride (Si 3 N 4) or silicon dioxide (SiO 2), by the reaction: SiO2 + 4HF + 2NH4F → (NH4 ...
Ammonium fluoride is a critical component of buffered oxide etch (BOE), a wet etchant used in microfabrication. It acts as the buffering agent in a solution of concentrated HF , creating an etchant with a more controllable rate of etching (than that of simple concentrated HF solutions).
Green and white sea glass. Sea glass are naturally weathered pieces of the anthropogenic glass fragments of typically drinkwares, which often have the appearance of tumbled stones. Sea glass is physically polished and chemically weathered glass found on beaches along bodies of salt water. These weathering processes produce natural frosted glass ...
Infobox references. Tetramethylammonium hydroxide (TMAH or TMAOH) is a quaternary ammonium salt with molecular formula N (CH 3) 4+ OH −. It is commonly encountered in form of concentrated solutions in water or methanol. TMAH in solid state and its aqueous solutions are all colorless, but may be yellowish if impure.
Wet etching tanks. It is used in the semiconductor industry as a major component of Wright etch and buffered oxide etch, which are used to clean silicon wafers. In a similar manner it is also used to etch glass by treatment with silicon dioxide to form gaseous or water-soluble silicon fluorides. It can also be used to polish and frost glass. [5]
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