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  2. Atomic layer deposition - Wikipedia

    en.wikipedia.org/wiki/Atomic_layer_deposition

    There, the starting surface contains hydroxyls (OH groups) as reactive sites; Step 1 is the reaction of TMA; Step 2 is a purge or evacuation step, Step 3 is the reaction of water, and Step 4 is a purge or evacuation step. [1] Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical ...

  3. Bayer process - Wikipedia

    en.wikipedia.org/wiki/Bayer_process

    The Bayer process is the principal industrial means of refining bauxite to produce alumina (aluminium oxide) and was developed by Carl Josef Bayer. Bauxite, the most important ore of aluminium , contains only 30–60% aluminium oxide (Al 2 O 3 ), the rest being a mixture of silica , various iron oxides , and titanium dioxide . [ 1 ]

  4. Hall–Héroult process - Wikipedia

    en.wikipedia.org/wiki/Hall–Héroult_process

    The Hall–Héroult process is the major industrial process for smelting aluminium. It involves dissolving aluminium oxide (alumina) (obtained most often from bauxite , aluminium 's chief ore, through the Bayer process ) in molten cryolite and electrolyzing the molten salt bath, typically in a purpose-built cell.

  5. Aluminium smelting - Wikipedia

    en.wikipedia.org/wiki/Aluminium_smelting

    The process produces a quantity of fluoride waste: perfluorocarbons and hydrogen fluoride as gases, and sodium and aluminium fluorides and unused cryolite as particulates. This can be as small as 0.5 kg per tonne of aluminium in the best plants in 2007, up to 4 kg per tonne of aluminium in older designs in 1974.

  6. In situ chemical oxidation - Wikipedia

    en.wikipedia.org/wiki/In_situ_chemical_oxidation

    These reactions do not occur step by step but simultaneously. When applied to In Situ Chemical Oxidation, the collective reaction results in the degradation of contaminants in the presence of Fe 2+ as a catalyst. The overall end result of the process can be described by the following reaction: H 2 O 2 + contaminant → H 2 O + CO 2 + O 2

  7. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    PVD process flow diagram. Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from ...

  8. Vacuum deposition - Wikipedia

    en.wikipedia.org/wiki/Vacuum_deposition

    Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below atmospheric pressure (i.e., vacuum ).

  9. Aluminium oxide - Wikipedia

    en.wikipedia.org/wiki/Aluminium_oxide

    Aluminium oxide (or aluminium(III) oxide) is a chemical compound of aluminium and oxygen with the chemical formula Al 2 O 3. It is the most commonly occurring of several aluminium oxides, and specifically identified as aluminium oxide. It is commonly called alumina and may also be called aloxide, aloxite, or alundum in various forms and ...

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