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A SÜSS MicroTec MA6 mask aligner. An aligner, or mask aligner, is a system that produces integrated circuits (IC) using the photolithography process. It holds the photomask over the silicon wafer while a bright light is shone through the mask and onto the photoresist. The "alignment" refers to the ability to place the mask over precisely the ...
A proximity aligner puts a small gap of around 5 microns between the photomask and wafer. [38] In both cases, the mask covers the entire wafer, and simultaneously patterns every die. Contact printing/lithography is liable to damage both the mask and the wafer, [38] and this was the primary reason it was abandoned for high volume production ...
In photolithography, several masks are used in turn, each one reproducing a layer of the completed design, and together known as a mask set. A curvilinear photomask has patterns with curves, which is a departure from conventional photomasks which only have patterns that are completely vertical or horizontal, known as manhattan geometry.
The stepper emerged in the late 1970s but did not become widespread until the 1980s. This was because it was replacing an earlier technology, the mask aligner. Aligners imaged the entire surface of a wafer at the same time, producing many chips in a single operation.
This improved the life of the mask and allowed a more complex design, but had the downside that diffraction effects limited its use to relatively large features compared to the contact aligners. More annoying was the fact that the mask had to be aligned in three axes to make it perfectly flat relative to the wafer, which was a very slow process ...
Mask aligner may refer to: Clear aligners, transparent dental braces. Aligner (semiconductor), a system used to project photomasks in photolithography.
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The mask cost strongly benefits from the use of multiple patterning. The EUV single exposure mask has smaller features which take much longer to write than the immersion mask. Even though mask features are 4x larger than wafer features, the number of shots is exponentially increased for much smaller features.
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