Ad
related to: focused ion beam simulation lammps technology- Magnetron Sputtering
Plasma Based Deposition In Which
Ions Are Accelerated Toward Target
- Electron Beam Evaporation
Time-Tested Deposition Technology
For Producing High Purity Coatings
- Chemical Vapor Deposition
Deposit Conformal Films Without
The Need For High Vacuum Pumps
- Thermal Evaporation
Physical Vapor Deposition Technique
Used To Form Thin Film Coatings
- Magnetron Sputtering
Search results
Results from the WOW.Com Content Network
Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor industry, materials science and increasingly in the biological field for site-specific analysis, deposition, and ablation of materials. A FIB setup is a scientific instrument that resembles a scanning electron microscope (SEM).
Ion-beam lithography, or ion-projection lithography, is similar to Electron beam lithography, but uses much heavier charged particles, ions. In addition to diffraction being negligible, ions move in straighter paths than electrons do both through vacuum and through matter, so there seems be a potential for very high resolution.
Ion beam analysis (IBA) is an important family of modern analytical techniques involving the use of MeV ion beams to probe the composition and obtain elemental depth profiles in the near-surface layer of solids. IBA is not restricted to MeV energy ranges.
Large-scale Atomic/Molecular Massively Parallel Simulator (LAMMPS) is a molecular dynamics program from Sandia National Laboratories. [1] LAMMPS makes use of Message Passing Interface (MPI) for parallel communication and is free and open-source software , distributed under the terms of the GNU General Public License .
The term itself was coined by Golovchenko and co-workers at Harvard in the paper "Ion-beam sculpting at nanometer length scales." [ 1 ] In the process, solid-state nanopores are formed by lateral mass transport about the surface of the substrate, not simply by sputtering , which is the removal of material from the surface.
As the input parameters, it needs the ion type and energy (in the range 10 eV – 2 GeV) and the material of one or several target layers. As the output, it lists or plots the three-dimensional distribution of the ions in the solid and its parameters, such as penetration depth, its spread along the ion beam (called straggle) and perpendicular to it, all target atom cascades in the target are ...
EBIC – Electron beam induced current (see IBIC: ion beam induced charge) EBS – Elastic (non-Rutherford) backscattering spectrometry (see RBS) EBSD – Electron backscatter diffraction; ECOSY – Exclusive correlation spectroscopy; ECT – Electrical capacitance tomography; EDAX – Energy-dispersive analysis of x-rays
The serial sectioning can be performed using a variety of methods, including mechanical polishing, [156] focused ion beam (FIB) milling, [157] or ultramicrotomy. [158] The choice of sectioning method depends on the size and shape of the sample, on its chemical composition, reactivity and mechanical properties, as well as the desired resolution ...
Ad
related to: focused ion beam simulation lammps technology