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  2. Cathodic arc deposition - Wikipedia

    en.wikipedia.org/wiki/Cathodic_arc_deposition

    Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films.

  3. Category:Physical vapor deposition techniques - Wikipedia

    en.wikipedia.org/wiki/Category:Physical_vapor...

    Print/export Download as PDF; Printable version; ... Cathodic arc deposition; E. Evaporation (deposition) H. High-power impulse magnetron sputtering; I.

  4. Ion beam deposition - Wikipedia

    en.wikipedia.org/wiki/Ion_beam_deposition

    Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]

  5. Physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Physical_vapor_deposition

    Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...

  6. Category:Thin film deposition - Wikipedia

    en.wikipedia.org/wiki/Category:Thin_film_deposition

    Download as PDF; Printable version; ... Pages in category "Thin film deposition" ... Cathodic arc deposition; Chemical bath deposition;

  7. Electrophoretic deposition - Wikipedia

    en.wikipedia.org/wiki/Electrophoretic_deposition

    In certain applications, such as the deposition of ceramic materials, voltages above 3–4V cannot be applied in aqueous EPD if it is necessary to avoid the electrolysis of water. However, higher application voltages may be desirable in order to achieve higher coating thicknesses or to increase the rate of deposition.

  8. Electron-beam physical vapor deposition - Wikipedia

    en.wikipedia.org/wiki/Electron-beam_physical...

    However, when vapor deposition is performed at pressures of roughly 10 −4 Torr (1.3 × 10 −4 hPa) or higher, significant scattering of the vapor cloud takes place such that surfaces not in sight of the source can be coated. Strictly speaking, the slow transition from line-of-sight to scattered deposition is determined not only by pressure ...

  9. Electrochemical stripping analysis - Wikipedia

    en.wikipedia.org/wiki/Electrochemical_stripping...

    Cathodic stripping voltammetry is a voltammetric method for quantitative determination of specific ionic species. [6] It is similar to the trace analysis method anodic stripping voltammetry , except that for the plating step, the potential is held at an oxidizing potential, and the oxidized species are stripped from the electrode by sweeping ...