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Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film. The technique can be used to deposit metallic, ceramic, and composite films.
Print/export Download as PDF; Printable version; ... Cathodic arc deposition; E. Evaporation (deposition) H. High-power impulse magnetron sputtering; I.
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam. [1] Ion beam deposition setup with mass separator. An ion beam deposition apparatus typically consists of an ion source, ion optics, and the deposition target. Optionally a mass analyzer can be incorporated. [2]
Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polymers. PVD is characterized by a process in which the material transitions from a condensed phase to a ...
Download as PDF; Printable version; ... Pages in category "Thin film deposition" ... Cathodic arc deposition; Chemical bath deposition;
In certain applications, such as the deposition of ceramic materials, voltages above 3–4V cannot be applied in aqueous EPD if it is necessary to avoid the electrolysis of water. However, higher application voltages may be desirable in order to achieve higher coating thicknesses or to increase the rate of deposition.
However, when vapor deposition is performed at pressures of roughly 10 −4 Torr (1.3 × 10 −4 hPa) or higher, significant scattering of the vapor cloud takes place such that surfaces not in sight of the source can be coated. Strictly speaking, the slow transition from line-of-sight to scattered deposition is determined not only by pressure ...
Cathodic stripping voltammetry is a voltammetric method for quantitative determination of specific ionic species. [6] It is similar to the trace analysis method anodic stripping voltammetry , except that for the plating step, the potential is held at an oxidizing potential, and the oxidized species are stripped from the electrode by sweeping ...