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  2. Photomask - Wikipedia

    en.wikipedia.org/wiki/Photomask

    The costs of creating new mask shop for 180 nm processes were estimated in 2005 as $40 million, and for 130 nm - more than $100 million. [26] The purchase price of a photomask, in 2006, could range from $250 to $100,000 [27] for a single high-end phase-shift mask. As many as 30 masks (of varying price) may be required to form a complete mask set.

  3. Photoresist - Wikipedia

    en.wikipedia.org/wiki/Photoresist

    Contrast is the difference from exposed portion to unexposed portion. The higher the contrast is, the more obvious the difference between exposed and unexposed portions would be. Sensitivity Sensitivity is the minimum energy that is required to generate a well-defined feature in the photoresist on the substrate, measured in mJ/cm 2. The ...

  4. Stepper - Wikipedia

    en.wikipedia.org/wiki/Stepper

    A variety of reticles, each appropriate for one stage in the process, are contained in a rack in the reticle loader, usually located at the upper front of the stepper. Before the wafer is exposed a reticle is loaded onto the reticle stage by a robot, where it is also very precisely aligned. Since the same reticle can be used to expose many ...

  5. Oil drying agent - Wikipedia

    en.wikipedia.org/wiki/Oil_drying_agent

    In 1925, stable napthenate driers were developed in Germany and commercialised in the US in the early 1930s, in parallel with the development of durable and fast-drying alkyd resin enamels. In the 1950s, metallo-organics based on synthetic acids were introduced as driers. [2] An early work on the drying oils and oil drying agents was by Andés ...

  6. Resolution enhancement technologies - Wikipedia

    en.wikipedia.org/wiki/Resolution_enhancement...

    With a proper optical imaging system between the mask and the wafer (or no imaging system if the mask is sufficiently closely positioned to the wafer such as in early lithography machines), the mask pattern is imaged on a thin layer of photoresist on the surface of the wafer and a light (UV or EUV)-exposed part of the photoresist experiences ...

  7. Tape-out - Wikipedia

    en.wikipedia.org/wiki/Tape-out

    The term tapeout currently is used to describe the creation of the photomask itself from the final approved electronic CAD file. Designers may use this term to refer to the writing of the final file to disk or CD and its subsequent transmission to the semiconductor foundry; however, in current practice the foundry will perform checks and make modifications to the mask design specific to the ...

  8. Drew Barrymore says her pores were 'visibly gone' after using ...

    www.aol.com/lifestyle/drew-barrymore-says-her...

    "Drying masks take some time to impact your pores, so be consistent to see the best results," Rodney says. $17 at Walmart The reviews quoted above reflect the most recent versions at the time of ...

  9. Staining - Wikipedia

    en.wikipedia.org/wiki/Staining

    Simple Staining is a technique that only uses one type of stain on a slide at a time. Because only one stain is being used, the specimens (for positive stains) or background (for negative stains) will be one color. Therefore, simple stains are typically used for viewing only one organism per slide. Differential staining uses multiple stains per ...