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Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
TSMC was the first foundry to market 7-nanometre and 5-nanometre (used by the 2020 Apple A14 and M1 SoCs, the MediaTek Dimensity 8100, and AMD Ryzen 7000 series processors) production capabilities, and the first to commercialize ASML's extreme ultraviolet (EUV) lithography technology in high volume.
AMSTERDAM (Reuters) -Taiwanese chipmaker TSMC does not necessarily need to use ASML's next generation "High NA EUV" machines for an upcoming generation of chip manufacturing technology called A16 ...
Taiwan Semiconductor, or TSMC for short, is the world's leading semiconductor contract manufacturer. ... Intel has been the company most receptive to ASML's new technology, being the first to get ...
This is a list of semiconductor fabrication plants, factories where integrated circuits (ICs), also known as microchips, are manufactured.They are either operated by Integrated Device Manufacturers (IDMs) that design and manufacture ICs in-house and may also manufacture designs from design-only (fabless firms), or by pure play foundries that manufacture designs from fabless companies and do ...
Zhang said that TSMC does not believe it needs to use a ASML's new "High NA EUV" lithography tool machines to build the A16 chips. ... TSMC also revealed a new technology for suppling power to ...
13.5 nm extreme ultraviolet (EUV) lithography, long considered a leading candidate for next-generation lithography, began to enter commercial mass-production in 2018. [1] As of 2021, Samsung and TSMC were gradually phasing EUV lithography into their production lines, as it became economical to replace multiple processing steps with single EUV ...
The head of technology development at Intel, Ann Kelleher, first mentioned the progress during a talk at the SPIE lithography conference on Tuesday in San Jose. ASML confirmed Kelleher's remarks ...