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An umbilical line is a catheter that is inserted into one of the two arteries or the vein of the umbilical cord.Generally the UAC/UVC (Umbilical Artery Catheter/Umbilical Vein Catheter) is used in Neonatal Intensive Care Units (NICU) as it provides quick access to the central circulation of premature infants.
There has also been a growing interest in ultraviolet communication (UVC) as a result of recent progress in solid-state optical sources/detectors operating within solar-blind UV spectrum (200–280 nm). In this so-called deep UV band, solar radiation is negligible at the ground level and this makes possible the design of photon-counting ...
A peripherally inserted central catheter (PICC or PICC line), also called a percutaneous indwelling central catheter or longline, [1] is a form of intravenous access that can be used for a prolonged period of time (e.g., for long chemotherapy regimens, extended antibiotic therapy, or total parenteral nutrition) or for administration of substances that should not be done peripherally (e.g ...
Since UVC extends to 100 nm, there is some overlap in the terms. The main uses of extreme ultraviolet radiation are photoelectron spectroscopy , solar imaging , and lithography . In air , EUV is the most highly absorbed component of the electromagnetic spectrum, requiring high vacuum for transmission.
Umbilical venous catheter or umbilical vein catheter, a type of umbilical line in neonatal medicine USB video device class , for connecting video cameras Far Ultraviolet Camera/Spectrograph , one of the experiments deployed on the lunar surface by the Apollo 16 astronauts
The Trendelenburg position is also used when placing a central venous catheter in the internal jugular or subclavian vein. The Trendelenburg position uses gravity to assist in the filling and distension of the upper central veins, as well as the external jugular vein. It plays no role in the placement of a femoral central venous catheter. [7]
From the early 1960s through the mid-1980s, Hg lamps had been used in lithography for their spectral lines at 436 nm ("g-line"), 405 nm ("h-line") and 365 nm ("i-line"). However, with the semiconductor industry's need for both higher resolution (to produce denser and faster chips) and higher throughput (for lower costs), lamp-based lithography ...
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.