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  2. Photographic emulsion - Wikipedia

    en.wikipedia.org/wiki/Photographic_emulsion

    Photographic emulsion is a light-sensitive colloid used in film-based photography. Most commonly, in silver-gelatin photography , it consists of silver halide crystals dispersed in gelatin . The emulsion is usually coated onto a substrate of glass , films (of cellulose nitrate , cellulose acetate or polyester ), paper, or fabric.

  3. Photolithography - Wikipedia

    en.wikipedia.org/wiki/Photolithography

    For very small, dense features (< 125 or so nm), lower resist thicknesses (< 0.5 microns) are needed to overcome collapse effects at high aspect ratios; typical aspect ratios are < 4:1. The photoresist-coated wafer is then prebaked to drive off excess photoresist solvent, typically at 90 to 100 °C for 30 to 60 seconds on a hotplate. [ 24 ]

  4. Photosensitizer - Wikipedia

    en.wikipedia.org/wiki/Photosensitizer

    Instead, scientists would refer to photosensitizers as sensitizers used in photo-oxidation or photo-oxygenation processes. Studies during this time period involving photosensitizers utilized organic photosensitizers, consisting of aromatic hydrocarbon molecules, which could facilitate synthetic chemistry reactions.

  5. Reciprocity (photography) - Wikipedia

    en.wikipedia.org/wiki/Reciprocity_(photography)

    Light can be considered to be a stream of discrete photons, and a light-sensitive emulsion is composed of discrete light-sensitive grains, usually silver halide crystals. Each grain must absorb a certain number of photons in order for the light-driven reaction to occur and the latent image to form. In particular, if the surface of the silver ...

  6. Photoresist - Wikipedia

    en.wikipedia.org/wiki/Photoresist

    To explain this in graphical form you may have a graph on Log exposure energy versus fraction of resist thickness remaining. The positive resist will be completely removed at the final exposure energy and the negative resist will be completely hardened and insoluble by the end of exposure energy. The slope of this graph is the contrast ratio.

  7. Film speed - Wikipedia

    en.wikipedia.org/wiki/Film_speed

    For example, an emulsion rated at 250 H&D would require ten times the exposure of an emulsion rated at 2500 H&D. [7] The methods to determine the sensitivity were later modified in 1925 (in regard to the light source used) and in 1928 (regarding light source, developer and proportional factor)—this later variant was sometimes called "H&D 10".

  8. Photographic processing - Wikipedia

    en.wikipedia.org/wiki/Photographic_processing

    The developer diffuses into the film emulsion to react with its layers. [10] This process happens simultaneously for all three colors of couplers in the film: cyan (in the red-sensitive layer in the film), magenta(for the green-sensitive layer), and yellow (for the blue-sensitive layer). [ 6 ]

  9. Chemistry of photolithography - Wikipedia

    en.wikipedia.org/wiki/Chemistry_of_photolithography

    The mask allows for precise control over the doping and etching processes used to form devices on silicon wafers. It is important for the mask to hold up to chemical attack during the etching process. Photoresists have three major components, a solvent, resin, and sensitizer (or photoactive compound).