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Download as PDF; Printable version; ... Tantalum is a chemical element ... USGS data published in January 2021 indicated that close to 40% of the world's tantalum ...
The CompTox Chemicals Dashboard is a freely accessible online database created and maintained by the U.S. Environmental Protection Agency (EPA). The database provides access to multiple types of data including physicochemical properties, environmental fate and transport, exposure, usage, in vivo toxicity, and in vitro bioassay.
Tantalum pentoxide, also known as tantalum(V) oxide, is the inorganic compound with the formula Ta 2 O 5. It is a white solid that is insoluble in all solvents but is attacked by strong bases and hydrofluoric acid. Ta 2 O 5 is an inert material with a high refractive index and low absorption (i.e. colourless), which makes it useful for coatings ...
The mineral group tantalite [(Fe, Mn)Ta 2 O 6] is the primary source of the chemical element tantalum, a corrosion (heat and acid) resistant metal.It is chemically similar to columbite, and the two are often grouped together as a semi-singular mineral called coltan or "columbite-tantalite" in many mineral guides.
There are 2 parts per million of tantalum in the Earth's crust, making it the 51st most abundant element there. Soil contains on average 1 to 2 parts per billion of tantalum, and seawater contains 2 parts per trillion of tantalum. A typical human contains 2.9 parts per billion of tantalum. Tantalum is found in the minerals tantalite and ...
Tantalum(V) chloride, also known as tantalum pentachloride, is an inorganic compound with the formula TaCl 5. It takes the form of a white powder and is commonly used as a starting material in tantalum chemistry.
Coltan is the colloquial name for the mineral columbite-tantalum ("col-tan"). In the early 21st century coltan mining is associated with human rights violations such as child labour, systematic exploitation of the population by governments or militant groups, exposure to toxic chemicals and other hazards as a result of lax environmental protection, and general safety laws and regulations. [1]
Tantalum boride films can be deposited from a gas mixture of TaCl 5-BCl 3-H 2-Ar in the temperature range 540–800 °C. TaB 2 (single-phase) is deposited at a source gas flow ratio (BCl 3 /TaCl 5) of six and a temperature above 600 °C.